H01J 37/32825
Working under atmospheric pressure or higher
Official title: {Working under atmospheric pressure or higher}
H01J37/32825 (Working under atmospheric pressure or higher) appears on 179 US grants and 287 published applications in this corpus.
Search patents in H01J- Granted patents
- 179
- Published applications
- 287
- Assignees
- 160
- Inventors
- 616
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 2 |
| 2003 | 0 | 3 |
| 2004 | 2 | 3 |
| 2005 | 1 | 3 |
| 2006 | 3 | 8 |
| 2007 | 3 | 7 |
| 2008 | 3 | 13 |
| 2009 | 3 | 12 |
| 2010 | 3 | 15 |
| 2011 | 3 | 7 |
| 2012 | 6 | 9 |
| 2013 | 12 | 10 |
| 2014 | 5 | 9 |
| 2015 | 5 | 13 |
| 2016 | 14 | 23 |
| 2017 | 12 | 20 |
| 2018 | 12 | 11 |
| 2019 | 11 | 17 |
| 2020 | 8 | 10 |
| 2021 | 13 | 22 |
| 2022 | 9 | 13 |
| 2023 | 12 | 26 |
| 2024 | 10 | 10 |
| 2025 | 13 | 13 |
| 2026 | 10 | 8 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Methods and apparatus for generating atmospheric pressure, low temperature plasma6 Oct 2026US 12,757,313 B2TellaPure, LLC
- Surface modification method15 Sep 2026US 12,738,465 B2Sekisui Chemical Co., Ltd.
- Plasma generating apparatus and method for operating same23 Jun 2026US 12,665,167 B2En2Core Technology, Inc.
- Surface processing equipment2 Jun 2026US 12,646,696 B2Industrial Technology Research Institute
- Integrated atmospheric plasma treatment station in processing tool2 Jun 2026US 12,648,418 B2Lam Research Corporation
- Substrate processing apparatus and substrate processing method24 Sep 2026US 2026/0290753 A1Tokyo Electron Limited
- Plasma output monitoring system24 Sep 2026US 2026/0290767 A1Asmpt Singapore Pte. Ltd.
- System and method for a double-sided atmospheric plasma head13 Aug 2026US 2026/0237602 A1Ontos Equipment Systems, Inc.
- Systems for fluxless bonding using an atmospheric pressure plasma and methods for performing the same28 May 2026US 2026/0148938 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Dry etching device and method21 May 2026US 2026/0142133 A1Beijing Goldenpower Electronic Technology Co., Ltd.
Most cited
By later US patents
- Plasma generating device and method of plasma processing136US 5,221,427 ASemiconductor Energy Laboratory Co.Ltd. · 1993
- Treatment method in glow-discharge plasma and apparatus thereof117US 5,968,377 ASekisui Chemical Co., Ltd. · 1999
- Discharge methods and electrodes for generating plasmas at one atmosphere of pressure, and materials treated therewith70US 5,895,558 AThe University of Tennessee Research Corporation · 1999
- Method of producing powder with composite grains and the device for carrying out said method70US 7,172,790 B2APIT Corp. S.A. · 2007
- Low-temperature, converging, reactive gas source and method of use68US 8,328,982 B1Surfx Technologies LLC · 2012