Plasma generating apparatus and method for operating same
AssigneeEn2Core Technology, Inc.
InventorsSae Hoon Uhm, Yun Seong Lee, Yeong Hoon Sohn, Se Hong Park
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Abstract
A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.
Claims16
A plasma generation apparatus of processing a target gas at atmospheric pressure, the plasma generation apparatus comprising:
- a discharging tube;
- a first antenna structure disposed on one side of the discharging tube;
- a second antenna structure disposed on other side of the discharging tube, the second antenna structure is spaced apart from the first antenna structure;
- and
- a controller configured to control a first AC voltage applied to the first antenna structure and a second AC voltage applied to the second antenna structure,
- wherein the controller is further configured to perform:
- a first voltage application mode that the controller controls to at least one of (i) applying of the first AC voltage to the first antenna structure and (ii) an applying of the second AC voltage to the second antenna structure, and
- a second voltage application mode that the controller controls to the applying of the second AC voltage to the second antenna structure,
- wherein the controller is further configured to:
- perform the first voltage application mode such that a plasma is formed in the discharging tube from an ignition gas injected to the discharging tube,
- monitor at least one of (i) a first power, (ii) a first current, (iii) a second power and (iv) a second current,
- wherein the first power and the first current are generated by the first AC voltage, and
- wherein the second power and the second current are generated by the second AC voltage, and
- stop the first voltage application mode and perform the second voltage application mode such that the target gas injected to the discharging tube is processed, based on a result of the monitor.
A method of processing a target gas at atmospheric pressure by a plasma generation apparatus, wherein the plasma generation apparatus comprises (i) a discharging tube, (ii) a first antenna structure disposed on one side of the discharging tube, (iii) a second antenna structure disposed on other side of the discharging tube, the second antenna structure is spaced apart from the first antenna structure,
- the method comprising:
- performing at least one of (i) applying of the first AC voltage to the first antenna structure and (ii) an applying of the second AC voltage to the second antenna structure;
- and
- applying of the second AC voltage to the second antenna structure,
- wherein the performing at least one of (i) applying of the first AC voltage and (ii) an applying of the second AC voltage comprising:
- performing at least one of (i) applying of the first AC voltage to the first antenna structure and (ii) an applying of the second AC voltage to the second antenna structure such that a plasma is formed in the discharging tube from an ignition gas injected to the discharging tube;
- and
- monitoring at least one of (i) a first power, (ii) a first current, (iii) a second power and (iv) a second current,
- wherein the first power and the first current are generated by the first AC voltage, and
- wherein the second power and the second current are generated by the second AC voltage;
- wherein the applying of the second AC voltage comprising:
- stopping to perform at least one of (i) applying of the first AC voltage and (ii) an applying of the second AC voltage and applying the second AC voltage such that the target gas injected to the discharging tube is processed, based on a result of the monitoring.
Dependencies are inferred from the claim text.