Discharge methods and electrodes for generating plasmas at one atmosphere of pressure, and materials treated therewith
AssigneeThe University of Tennessee Research Corporation
InventorPaul D. Spence
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AssigneeThe University of Tennessee Research Corporation
InventorPaul D. Spence
Estimating the term…
Two methods and corresponding electrode designs are provided for the generation of a plasma at or about one atmosphere. Using these methods, various webs, films and three-dimensional objects are beneficially treated in a reduced amount of time. A first method utilizes a repetitive, asymmetric voltage pulse to generate a plasma discharge between two electrodes. An asymmetric voltage pulse is used to generate a discharge in which a substrate can be exposed predominately to either positive or negative plasma species depending on the voltage polarity used. A second method uses the gap capacitance of an electrode pair and an external inductor in shunt to form a resonant LC circuit. The circuit is driven by a high power radio frequency source operating at 1 to 30 MHz to generate a uniform discharge between the electrode pair. Both methods have temperature controlled discharge surfaces with supply gas temperature, humidity and flow rate control. The gas flow is typically sufficient to cause a turbulent flow field in the discharge region where materials are treated. Electrode pairs implement these methods and include a metal faced electrode and a dielectric covered electrode, one or both of which have a series of holes extending through the electrode face for supply gas flow. The second of the above-described methods will also operate with paired, metal faced electrodes, but under more restricted operating conditions.
A method for treating a surface of a substrate, including web and film substrates, to improve properties of the surface of the substrate, with a pair of electrodes, wherein each of the electrodes has an electrode face and wherein the faces of the electrodes are in opposing spaced relation to each other, the method comprising the steps of:
An apparatus for treating a surface of a substrate, including web and film substrates, to improve properties of the surface of the substrate, comprising:
A method for treating a surface of a substrate, including web and film substrates, to improve properties of the surface of the substrate, with a pair of electrodes, wherein each of the electrodes has an electrode face and wherein the faces of the electrodes are in opposing spaced relation to each other, the method comprising the steps of:
An apparatus for treating a surface of a substrate, including web and film substrates, to improve properties of the surface of the substrate, comprising:
Dependencies are inferred from the claim text.