H01J 37/32119
Windows
Official title: {Windows}
H01J37/32119 (Windows) appears on 159 US grants and 274 published applications in this corpus.
Search patents in H01J- Granted patents
- 159
- Published applications
- 274
- Assignees
- 59
- Inventors
- 534
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2004 | 0 | 1 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 2 |
| 2009 | 0 | 3 |
| 2010 | 0 | 2 |
| 2011 | 0 | 1 |
| 2012 | 0 | 8 |
| 2013 | 1 | 9 |
| 2014 | 2 | 11 |
| 2015 | 6 | 17 |
| 2016 | 9 | 12 |
| 2017 | 11 | 28 |
| 2018 | 16 | 19 |
| 2019 | 11 | 12 |
| 2020 | 16 | 8 |
| 2021 | 13 | 22 |
| 2022 | 10 | 25 |
| 2023 | 15 | 39 |
| 2024 | 17 | 21 |
| 2025 | 17 | 19 |
| 2026 | 15 | 15 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Plasma processing apparatus29 Sep 2026US 12,749,650 B2Tokyo Electron Limited
- Semiconductor reaction chamber29 Sep 2026US 12,749,651 B2Beijing Naura Microelectronics Equipment Co., Ltd.
- Substrate processing apparatus, method of manufacturing semiconductor device and plasma generating apparatus22 Sep 2026US 12,744,182 B2Kokusai Electric Corporation
- Segmented gas distribution plate for high-power, high-pressure processes22 Sep 2026US 12,744,189 B2Lam Research Corporation
- Window edge heater for high power plasma processing applications1 Sep 2026US 12,725,759 B2Lam Research Corporation
- Wave-assisted hybrid plasma source8 Oct 2026US 2026/0311966 A1Tokyo Electron Limited
- Monolithic modular high-frequency plasma source1 Oct 2026US 2026/0302134 A1APPLIED Materials.Inc.
- Cleaning process for plasma process chamber10 Sep 2026US 2026/0269197 A1
- System and Method for Atomic Layer Etching Using an Added Sidewall Coil in Proximity to a Chuck for Substrate Edge Uniformity Control13 Aug 2026US 2026/0237604 A1Inspiring Atoms Pte Ltd
- Components and processes for managing plasma process byproduct materials23 Jul 2026US 2026/0213142 A1Lam Research Corporation
Most cited
By later US patents
- Systems and methods for internal surface conditioning in plasma processing equipment149US 9,355,922 B2APPLIED Materials.Inc. · 2016
- Temperature controlled window of a plasma processing chamber component117US 8,970,114 B2Lam Research Corporation · 2015
- Chamber with flow-through source102US 9,934,942 B1APPLIED Materials.Inc. · 2018
- Inductive plasma source with high coupling efficiency67US 10,037,867 B2Mattson Technology, Inc. · 2018
- Transformer coupled capacitive tuning circuit with fast impedance switching for plasma etch chambers47US 9,515,633 B1Lam Research Corporation · 2016