Window edge heater for high power plasma processing applications

A plasma processing system, comprising:

• a chamber having a wall that surrounds a plasma processing region;
• an adapter structure configured to interface with a top of the wall of the chamber, the adapter structure configured to circumscribe a first opening, the adapter structure having a flange portion that circumscribes the first opening and projects into the first opening;
• a thermal insulator member disposed on the flange portion of the adapter structure, the thermal insulator member formed as a continuous circuitous structure;
• a window support frame disposed on the thermal insulator member, the window support frame configured to circumscribe a second opening, the window support frame having a top surface, a bottom surface, an inner surface, and an outer surface, each of the inner surface and outer surface extending between the top surface and the bottom surface, the window support frame including a channel formed within the outer surface;
• a heating element disposed within the channel of the window support frame, the heating element configured to substantially circumscribe the window support frame;
• and
• a window disposed on the window support frame such that a circuitous outer peripheral portion of the window is in thermal contact with the window support frame, the window substantially transparent to radiofrequency power.