H01J 37/141
Electromagnetic lenses
H01J37/141 (Electromagnetic lenses) appears on 338 US grants and 302 published applications in this corpus.
Search patents in H01J- Granted patents
- 338
- Published applications
- 302
- Assignees
- 112
- Inventors
- 625
- Latest grant
- 11 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 2 | 0 |
| 1979 | 1 | 0 |
| 1980 | 5 | 0 |
| 1981 | 1 | 0 |
| 1982 | 2 | 0 |
| 1983 | 6 | 0 |
| 1984 | 3 | 0 |
| 1985 | 5 | 0 |
| 1986 | 5 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 6 | 0 |
| 1990 | 7 | 0 |
| 1991 | 7 | 0 |
| 1992 | 1 | 0 |
| 1993 | 3 | 0 |
| 1994 | 1 | 0 |
| 1995 | 3 | 0 |
| 1996 | 2 | 0 |
| 1997 | 3 | 0 |
| 1998 | 5 | 0 |
| 1999 | 3 | 0 |
| 2000 | 5 | 0 |
| 2001 | 2 | 1 |
| 2002 | 12 | 9 |
| 2003 | 10 | 5 |
| 2004 | 5 | 8 |
| 2005 | 14 | 6 |
| 2006 | 3 | 4 |
| 2007 | 4 | 7 |
| 2008 | 5 | 7 |
| 2009 | 4 | 6 |
| 2010 | 3 | 3 |
| 2011 | 10 | 4 |
| 2012 | 8 | 11 |
| 2013 | 6 | 6 |
| 2014 | 7 | 5 |
| 2015 | 8 | 22 |
| 2016 | 17 | 12 |
| 2017 | 11 | 18 |
| 2018 | 13 | 11 |
| 2019 | 16 | 25 |
| 2020 | 19 | 26 |
| 2021 | 14 | 12 |
| 2022 | 18 | 18 |
| 2023 | 17 | 21 |
| 2024 | 8 | 24 |
| 2025 | 19 | 17 |
| 2026 | 7 | 14 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Adjustable permanent magnetic lens having thermal control device11 Aug 2026US 12,706,270 B2IMS Nanofabrication GmbH
- Charged particle apparatus and method7 Jul 2026US 12,676,278 B2ASML Netherlands B. V.
- Adjustable permanent magnetic lens having shunting device30 Jun 2026US 12,671,054 B2IMS Nanofabrication GmbH
- Magnetic lenses, charged particle microscope systems including the same, and associated methods19 May 2026US 12,633,490 B2FEI Company
- Multi charged particle beam writing apparatus12 May 2026US 12,626,886 B2NuFlare Technology, Inc.
- Aberration corrector, charged particle beam device including same, and control method for controlling same10 Sep 2026US 2026/0269170 A1Hitachi High-Tech Corporation
- Charged Particle Beam Device6 Aug 2026US 2026/0229443 A1Hitachi High-Tech Corporation
- Objective lens cooling system30 Jul 2026US 2026/0221375 A1ASML Netherlands B. V.
- Charged particle beam device23 Jul 2026US 2026/0213117 A1Hitachi High-Tech Corporation
- Nano-probe measurement system23 Jul 2026US 2026/0213120 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Objective lens, electron beam system and method of inspecting defect56US 7,420,164 B2Ebara Corporation · 2008
- Superconducting PYX structures49US 4,893,103 AThe United States of America as represented by the Secretary of the Army · 1990
- Method and apparatus for uniform charged particle irradiation of a surface48US 4,736,106 AMichigan State University · 1988
- Scanning electron microscope and a method of displaying cross sectional profiles using the same47US 5,057,689 AMatsushita Electric Industrial Co., Ltd. · 1991
- Apparatus of plural charged-particle beams41US 10,141,160 B2Hermes Microvision, Inc. · 2018