Multi charged particle beam writing apparatus

A multi charged particle beam writing apparatus comprising:

• a plurality of blankers performing blanking deflection on each of beams in a multi charged particle beam;
• a limiting aperture member blocking a beam in the multi charged particle beam, the beam being deflected by the blanker to achieve a beam-off state;
• two or more-stage objective lenses each comprised of a magnetic lens, and configured to focus the multi charged particle beam on a substrate, which has passed through the limiting aperture member;
• n (n is an integer greater than or equal to three) correction lenses correcting an imaging state of the multi charged particle beam on the substrate;
• and
• an electric field control electrode to which a positive constant voltage with respect to the substrate is applied, the electric field control electrode generating an electric field between the substrate and the electric field control electrode,
• wherein the two or more-stage objective lenses include a first objective lens, and a second objective lens placed most downstream in a travel direction of the multi charged particle beam,
• m (m is an integer such that n≥m≥1) correction lenses of the n correction lenses are magnetic correction lenses placed in a lens magnetic field of the second objective lens, and
• (n−m) correction lenses that are the n correction lenses other than the magnetic correction lenses are placed upstream of the lens magnetic field of the second objective lens in the travel direction of the multi charged particle beam.