H01J 2237/335
Cleaning
H01J2237/335 (Cleaning) appears on 321 US grants and 484 published applications in this corpus.
Search patents in H01J- Granted patents
- 321
- Published applications
- 484
- Assignees
- 142
- Inventors
- 1,292
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 3 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 2 | 0 |
| 1997 | 2 | 0 |
| 1998 | 0 | 0 |
| 1999 | 3 | 0 |
| 2000 | 5 | 0 |
| 2001 | 3 | 3 |
| 2002 | 2 | 5 |
| 2003 | 4 | 5 |
| 2004 | 2 | 5 |
| 2005 | 5 | 4 |
| 2006 | 1 | 9 |
| 2007 | 1 | 4 |
| 2008 | 1 | 11 |
| 2009 | 2 | 2 |
| 2010 | 7 | 3 |
| 2011 | 4 | 10 |
| 2012 | 6 | 2 |
| 2013 | 3 | 4 |
| 2014 | 2 | 8 |
| 2015 | 11 | 20 |
| 2016 | 8 | 16 |
| 2017 | 14 | 32 |
| 2018 | 13 | 28 |
| 2019 | 27 | 41 |
| 2020 | 24 | 35 |
| 2021 | 26 | 47 |
| 2022 | 31 | 38 |
| 2023 | 27 | 42 |
| 2024 | 28 | 38 |
| 2025 | 26 | 39 |
| 2026 | 25 | 33 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Semiconductor processing preclean methods and apparatus6 Oct 2026US 12,757,665 B2ASM IP Holding B. V.
- Enhanced dry desmear equipment with protective film peeling capability for integrated circuits29 Sep 2026US 12,749,660 B2Intel Corporation
- Method of operating a PVD apparatus22 Sep 2026US 12,745,577 B2SPTS Technologies Limited
- Cleaning method, recording medium, and substrate processing apparatus15 Sep 2026US 12,734,561 B2Kokusai Electric Corporation
- Scrubber, substrate processing system including the same, and substrate processing method using the same8 Sep 2026US 12,731,770 B2Korea Institute of Machinery & Materials
- Semiconductor processing preclean methods and apparatus17 Sep 2026US 2026/0282789 A1ASM IP Holding B. V.
- Integrated substrate processing apparatus and method20 Aug 2026US 2026/0242952 A1Picosun Oy
- Integrated substrate processing apparatus and method20 Aug 2026US 2026/0245835 A1Picosun Oy
- Semiconductor processing tool with rf-transmissive dome structure and dynamic cooling system & method for manufacturing rf-transmissive dome structure20 Aug 2026US 2026/0245842 A1Lam Research Corporation
- Surface Treatment For Selective Deposition13 Aug 2026US 2026/0234790 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Dilute remote plasma clean676US 6,329,297 B1APPLIED Materials.Inc. · 2001
- Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas571US 6,863,019 B2APPLIED Materials.Inc. · 2005
- Substrate cleaning chamber and components488US 7,942,969 B2APPLIED Materials.Inc. · 2011
- Method and systems for in-situ formation of intermediate reactive species486US 9,589,770 B2ASM IP Holding B. V. · 2017
- Pulsed remote plasma method and system476US 9,484,191 B2ASM IP Holding B. V. · 2016