Scrubber, substrate processing system including the same, and substrate processing method using the same

A substrate processing system, comprising:

• a substrate processing apparatus;
• a vacuum pump connected to the substrate processing apparatus;
• a scrubber connected to the vacuum pump;
• a vacuum conduit connecting the substrate processing apparatus to the vacuum pump;
• and
• a connection conduit connecting the vacuum pump to the scrubber,
• wherein the scrubber comprises:
• a plasma processing unit connected to the connection conduit, and comprising a plasma generator configured to generate plasma;
• and
• a combustion processing unit comprising a combustor, which is configured to produce a flame,
• wherein the scrubber is configured to provide a first reaction space in which the plasma is generated, and a second reaction space in which the flame is produced, and
• wherein a portion of the first reaction space and a portion of the second reaction space are overlapped with each other,
• wherein the scrubber further comprises a power supply configured to supply electric power to the plasma generator, and
• wherein the power supply is connected to the substrate processing apparatus and is configured to receive an electrical signal from the substrate processing apparatus.

A substrate processing method, comprising:

• preparing a substrate in a substrate processing apparatus;
• processing the substrate;
• and
• treating a waste gas exhausted from the substrate processing apparatus,
• wherein treating the waste gas is performed by a scrubber including a plasma generator and a combustor,
• wherein treating the waste gas comprises treating the waste gas using at least one of the plasma generator and the combustor, and
• wherein the plasma generator is configured to generate a plasma using the waste gas.