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US 9,484,191 B2Granted
Pulsed remote plasma method and system
AssigneeASM IP Holding B.V.
InventorJereld Lee Winkler
Life of this patent
Estimating the term…
Abstract
A system and method for providing pulsed excited species from a remote plasma unit to a reaction chamber are disclosed. The system includes a pressure control device to control a pressure at the remote plasma unit as reactive species from the remote plasma unit are pulsed to the reaction chamber.
Claims12
A remote plasma system comprising:
- a reactor comprising a reaction chamber;
- a remote plasma unit fluidly coupled to the reaction chamber and to a vacuum source;
- a pressure control device in fluid communication with and interposed between the remote plasma unit and the vacuum source, wherein the pressure control device controls an operating pressure of the remote plasma unit located upstream of the pressure control device;
- a control valve between the remote plasma unit and the reaction chamber to pulse species from the remote plasma unit to the reaction chamber;
- and
- a controller coupled to the pressure control device and to the control valve, the controller configured to simultaneously control the pressure control device and the control valve, so that the remote plasma unit operates under steady-state conditions as the species are pulsed to the reaction chamber.
3 more elements
A remote plasma-enhanced atomic layer deposition system comprising:
- an atomic layer deposition reactor comprising a reaction chamber;
- a remote plasma unit in fluid communication with the reaction chamber and a vacuum source;
- a first reactant source in fluid communication with the remote plasma unit;
- a pressure control device in fluid communication with and interposed between the remote plasma unit and the vacuum source, wherein the pressure control device controls an operating pressure of the remote plasma unit located upstream of the pressure control device;
- a control valve between the remote plasma unit and the reaction chamber;
- and
- a controller coupled to the pressure control device and to the control valve, the controller configured to simultaneously control the pressure control device and the control valve, so that the remote plasma unit operates under steady-state conditions as species from the remote plasma unit are pulsed to the reaction chamber.
4 more elements
Dependencies are inferred from the claim text.