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US 9,589,770 B2Granted
Method and systems for in-situ formation of intermediate reactive species
AssigneeASM IP Holding B.V.
InventorJereld Lee Winkler
Life of this patent
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Abstract
A system and method for providing intermediate reactive species from a remote plasma unit to a reaction chamber are disclosed. The system includes a pressure control device to control a pressure at the remote plasma unit as intermediate reactive species from the remote plasma unit are provided to the reaction chamber.
Claims20
A remote plasma system comprising:
- a reactor comprising a reaction chamber;
- a remote plasma unit fluidly coupled to the reaction chamber and to a vacuum source;
- a first gas source fluidly coupled to the remote plasma unit, wherein the first gas source comprises a precursor for intermediate reactive species;
- a pressure control device in fluid communication with and interposed between the remote plasma unit and the vacuum source, wherein the pressure control device controls a pressure upstream of the pressure control device and wherein the pressure control device is a closed-loop pressure control device;
- a control valve, between the remote plasma unit and the reaction chamber, to pulse the intermediate reactive species from the remote plasma unit to the reaction chamber and to maintain steady-state operation of remote plasma unit;
- and
- a controller coupled to the pressure control device and to the control valve and configured to control the pressure control device and the control valve to maintain steady-state operation of the remote plasma unit when the intermediate reactive species are pulsed to the reaction chamber using the control valve to switch a flow of the intermediate reactive species between the reaction chamber and the vacuum source.
4 more elements
A plasma-enhanced chemical vapor deposition system comprising:
- a deposition reactor comprising a reaction chamber;
- a remote plasma unit fluidly coupled to the reaction chamber and to a vacuum source;
- a first reactant source coupled to the remote plasma unit, wherein the first reactant source is a precursor for intermediate reactive species;
- a pressure control device in fluid communication with and interposed between the remote plasma unit and the vacuum source, wherein the pressure control device controls a pressure upstream of the pressure control device, and wherein the pressure control device is a closed-loop pressure control device;
- a control valve, between the remote plasma unit and the reaction chamber, to pulse the intermediate reactive species from the remote plasma unit to the reaction chamber and to maintain steady-state operation of remote plasma unit;
- and
- a controller coupled to the pressure control device and to the control valve to control the pressure control device and the control valve, the controller configured to maintain steady-state operation of the remote plasma unit when intermediate reactive species are pulsed to the reaction chamber using the control valve to switch a flow of the intermediate reactive species between the reaction chamber and the vacuum source.
4 more elements
A remote plasma system comprising:
- a reactor comprising a reaction chamber;
- a remote plasma unit fluidly coupled to the reaction chamber and to a vacuum source;
- a first gas source fluidly coupled to the remote plasma unit, wherein the first gas source comprises a precursor for intermediate reactive species;
- a pressure control device in fluid communication with and interposed between the remote plasma unit and the vacuum source, wherein the pressure control device controls a pressure upstream of the pressure control device and wherein the pressure control device is a closed-loop pressure control device;
- a control valve, between the remote plasma unit and the reaction chamber, to pulse the intermediate reactive species from the remote plasma unit to the reaction chamber and to maintain steady-state operation of remote plasma unit;
- a controller coupled to the pressure control device and to the control valve and configured to control the pressure control device and the control valve to maintain steady-state operation of the remote plasma unit when the intermediate reactive species are pulsed to the reaction chamber using the control valve to switch a flow of the intermediate reactive species between the reaction chamber and the vacuum source;
- and
- a catalyst between the remote plasma unit and the control valve, the catalyst comprising a material selected from the group consisting of, iron, magnesium oxide (MgO), titanium oxide (TiO2), platinum, palladium, and rhodium.
5 more elements
Dependencies are inferred from the claim text.