H01J 2237/2803
Characterised by the imaging method
Official title: characterised by the imaging method
H01J2237/2803 (Characterised by the imaging method) appears on 509 US grants and 557 published applications in this corpus.
Search patents in H01J- Granted patents
- 509
- Published applications
- 557
- Assignees
- 139
- Inventors
- 1,017
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 2 | 0 |
| 1996 | 4 | 0 |
| 1997 | 0 | 0 |
| 1998 | 2 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 1 |
| 2002 | 0 | 9 |
| 2003 | 5 | 3 |
| 2004 | 3 | 11 |
| 2005 | 5 | 3 |
| 2006 | 12 | 10 |
| 2007 | 13 | 15 |
| 2008 | 10 | 17 |
| 2009 | 5 | 17 |
| 2010 | 14 | 10 |
| 2011 | 12 | 15 |
| 2012 | 15 | 11 |
| 2013 | 8 | 20 |
| 2014 | 26 | 29 |
| 2015 | 26 | 53 |
| 2016 | 35 | 30 |
| 2017 | 39 | 38 |
| 2018 | 30 | 30 |
| 2019 | 38 | 35 |
| 2020 | 37 | 38 |
| 2021 | 34 | 43 |
| 2022 | 35 | 41 |
| 2023 | 34 | 27 |
| 2024 | 18 | 26 |
| 2025 | 27 | 16 |
| 2026 | 11 | 9 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Inspection system15 Sep 2026US 12,736,487 B2Hitachi High-Tech Corporation
- Detector substrate for use in a charged particle multi-beam assessment tool11 Aug 2026US 12,706,272 B2ASML Netherlands B. V.
- Luminescence method for the in-line detection of atomic scale defects during fabrication of 4H—SiC diodes16 Jun 2026US 12,660,570 B2The University of Hong Kong
- Charged particle source28 Apr 2026US 12,614,691 B2ASML Netherlands B. V.
- Inspection system21 Apr 2026US 12,609,269 B2Hitachi High-Tech Corporation
- Compensating for collection variation of scanning charged particle-optical apparatus8 Oct 2026US 2026/0311961 A1ASML Netherlands B. V.
- Multi-beam charged particle microscope design with improved detection system for secondary electron imaging over a large range of landing energies of primary electrons17 Sep 2026US 2026/0279723 A1
- Device, Control Method for Same, and Program20 Aug 2026US 2026/0245829 A1Hitachi High-Tech Corporation
- Rapid mode switching of charged-particle-beam devices13 Aug 2026US 2026/0237595 A1
- Processing Method and Charged Particle Beam Device30 Jul 2026US 2026/0221384 A1Hitachi High-Tech Corporation
Most cited
By later US patents
- Method for inspecting substrate, substrate inspecting system and electron beam apparatus113US 7,109,483 B2Ebara Corporation · 2006
- Charged particle beam system110US 8,304,725 B2Hitachi High-Technologies Corporation · 2012
- Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former61US 6,855,929 B2Ebara Corporation · 2005
- Electron beam apparatus and method of manufacturing semiconductor device using the apparatus56US 6,593,152 B2Ebara Corporation · 2003
- Apparatus of plural charged-particle beams51US 9,922,799 B2Hermes Microvision, Inc. · 2018