H01J 2237/2806
Secondary charged particle
H01J2237/2806 (Secondary charged particle) appears on 212 US grants and 242 published applications in this corpus.
Search patents in H01J- Granted patents
- 212
- Published applications
- 242
- Assignees
- 42
- Inventors
- 408
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 9 |
| 2003 | 3 | 1 |
| 2004 | 1 | 5 |
| 2005 | 1 | 2 |
| 2006 | 7 | 3 |
| 2007 | 8 | 6 |
| 2008 | 5 | 7 |
| 2009 | 2 | 4 |
| 2010 | 4 | 4 |
| 2011 | 3 | 3 |
| 2012 | 3 | 3 |
| 2013 | 2 | 2 |
| 2014 | 5 | 15 |
| 2015 | 14 | 36 |
| 2016 | 20 | 19 |
| 2017 | 24 | 19 |
| 2018 | 16 | 13 |
| 2019 | 23 | 17 |
| 2020 | 15 | 17 |
| 2021 | 12 | 13 |
| 2022 | 12 | 14 |
| 2023 | 10 | 11 |
| 2024 | 7 | 5 |
| 2025 | 8 | 8 |
| 2026 | 6 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Inspection system15 Sep 2026US 12,736,487 B2Hitachi High-Tech Corporation
- Detector substrate for use in a charged particle multi-beam assessment tool11 Aug 2026US 12,706,272 B2ASML Netherlands B. V.
- Charged particle source28 Apr 2026US 12,614,691 B2ASML Netherlands B. V.
- Inspection system21 Apr 2026US 12,609,269 B2Hitachi High-Tech Corporation
- Charged particle assessment tool, inspection method10 Feb 2026US 12,548,735 B2ASML Netherlands B. V.
- Compensating for collection variation of scanning charged particle-optical apparatus8 Oct 2026US 2026/0311961 A1ASML Netherlands B. V.
- Multi-beam charged particle microscope design with improved detection system for secondary electron imaging over a large range of landing energies of primary electrons17 Sep 2026US 2026/0279723 A1
- Device, Control Method for Same, and Program20 Aug 2026US 2026/0245829 A1Hitachi High-Tech Corporation
- Charged particle assessment tool, inspection method28 May 2026US 2026/0148935 A1ASML Netherlands B. V.
- Systems and methods for compensating dispersion of a beam separator in a single-beam or multi-beam apparatus12 Feb 2026US 2026/0045442 A1ASML Netherlands B. V.
Most cited
By later US patents
- Method for inspecting substrate, substrate inspecting system and electron beam apparatus113US 7,109,483 B2Ebara Corporation · 2006
- Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former61US 6,855,929 B2Ebara Corporation · 2005
- Electron beam apparatus and method of manufacturing semiconductor device using the apparatus56US 6,593,152 B2Ebara Corporation · 2003
- Apparatus of plural charged-particle beams51US 9,922,799 B2Hermes Microvision, Inc. · 2018
- Electron beam apparatus and device fabrication method using the electron beam apparatus43US 7,244,932 B2Ebara Corporation · 2007