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AssigneeHitachi High-Tech Corporation
InventorsNatsuki Tsuno, Yasuhiro Shirasaki, Minami Shouji, Daisuke Bizen, Makoto Suzuki, Satoshi Takada, Yohei Nakamura
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This inspection system 100 comprises: an electron source 102 which irradiates a sample 200 with an inspection beam; a detector 105 which detects secondary electrons obtained by irradiating the sample 200 with the inspection beam and outputs a detection signal; a laser device 107 which emits an action laser that changes the amount of secondary electrons; an electron gun 106 which emits an action electron beam that changes the amount of secondary electrons; and a computer system 140 which generates an image of the sample 200 on the basis of the detection signal. The computer system 140 generates an inspection image I1 related to the emission of the inspection beam, acquires the dimensions and the like related to a pattern on the sample 200 on the basis of the inspection image I1, generates an inspection image I2 related to the emission of the action laser and the inspection beam, acquires the material characteristics related to the pattern on the basis of the inspection image I2, generates an inspection image I3 related to the emission of the action electron beam and the inspection beam, and acquires the electrical characteristics related to the pattern on the basis of the inspection image I3.
An inspection system comprising:
An inspection system comprising:
An inspection system comprising:
An inspection method comprising:
A non-transitory computer readable medium comprising a plurality of instructions that, when executed by a processor, cause the processor to:
Dependencies are inferred from the claim text.