Inspection system

An inspection system for inspecting electric characteristics of a sample, the inspection system comprising:

• a charged particle beam device and a computer system, wherein
• a plurality of inspection regions are set in the sample, and respective inspection points are set for a plurality of specific inspection patterns included in the inspection region,
• the charged particle beam device includes
• a charged particle optical system configured to irradiate the sample with a pulse charged particle beam,
• a detection system configured to detect secondary charged particles emitted when the sample is irradiated with the pulse charged particle beam, and output a secondary charged particle signal corresponding to an amount of detected secondary charged particles, and
• a control unit configured to control the charged particle optical system to irradiate the sample with the pulse charged particle beam under a plurality of pulse conditions,
• the computer system is configured to
• obtain determination data indicating a secondary charged particle signal from the inspection pattern included in the inspection region corresponding to the plurality of pulse conditions based on measurement data indicating a secondary charged particle signal from the inspection pattern corresponding to the plurality of pulse conditions, the measurement data being obtained by irradiating the inspection pattern with the pulse charged particle beam under the plurality of pulse conditions for each of the plurality of inspection points included in the inspection region, and
• instruct the control unit to execute a static elimination sequence for eliminating charging of the inspection region when an error between the determination data and reference data is equal to or greater than a predetermined threshold, the reference data being data indicating the secondary charged particle signal from a reference pattern corresponding to the plurality of pulse conditions, the reference data being obtained by irradiating the reference pattern with the pulse charged particle beam under the plurality of pulse conditions, and
• the reference pattern is a pattern that has the same electric characteristics as the inspection pattern and in which initial charging caused by electric charges that are not emitted according to a discharge time constant of the sample is negligible.