H01J 2237/2804
Scattered primary beam
H01J2237/2804 (Scattered primary beam) appears on 99 US grants and 112 published applications in this corpus.
Search patents in H01J- Granted patents
- 99
- Published applications
- 112
- Assignees
- 47
- Inventors
- 275
- Latest grant
- 11 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 1 |
| 2004 | 2 | 3 |
| 2005 | 1 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 1 |
| 2008 | 0 | 2 |
| 2009 | 0 | 1 |
| 2010 | 2 | 1 |
| 2011 | 1 | 4 |
| 2012 | 1 | 0 |
| 2013 | 1 | 6 |
| 2014 | 7 | 6 |
| 2015 | 8 | 8 |
| 2016 | 2 | 6 |
| 2017 | 6 | 5 |
| 2018 | 5 | 5 |
| 2019 | 8 | 13 |
| 2020 | 14 | 14 |
| 2021 | 12 | 10 |
| 2022 | 4 | 6 |
| 2023 | 9 | 10 |
| 2024 | 4 | 7 |
| 2025 | 7 | 2 |
| 2026 | 3 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Detector substrate for use in a charged particle multi-beam assessment tool11 Aug 2026US 12,706,272 B2ASML Netherlands B. V.
- Detector and method for obtaining Kikuchi images14 Apr 2026US 12,603,246 B2Bruker Nano, Inc.
- Charged particle assessment tool, inspection method10 Feb 2026US 12,548,735 B2ASML Netherlands B. V.
- Observation system, observation method, and program16 Dec 2025US 12,500,061 B2Hitachi High-Tech Corporation
- Charged particle beam device and image acquisition method30 Sep 2025US 12,431,326 B2JEOL Ltd.
- Charged particle assessment tool, inspection method28 May 2026US 2026/0148935 A1ASML Netherlands B. V.
- Charged particle device, detector, and methods13 Nov 2025US 2025/0349504 A1ASML Netherlands B. V.
- Electron microscope detector and related methods24 Jul 2025US 2025/0239431 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Multiple charged particle beam system with a mirror mode of operation, method for operating a multi-beam charged particle microscope system with a mirror mode of operation and associated computer program product7 Nov 2024US 2024/0371596 A1
- Electron beam probing techniques and related structures24 Oct 2024US 2024/0355685 A1Micron Technology, Inc.
Most cited
By later US patents
- Apparatus and method for e-beam dark imaging with perspective control25US 7,838,833 B1KLA-Tencor Technologies Corporation · 2010
- Scanning transmission electron microscopes18US 4,514,629 ANational Research Development Corporation · 1985
- Ultimate analyzer, scanning transmission electron microscope and ultimate analysis method10US 6,794,648 B2Hitachi, Ltd. · 2004
- Low voltage scanning electron microscope and method for specimen observation9US 10,777,382 B2Focus-Ebeam Technology (Beijing) Co., Ltd. · 2020
- Electron/ion microscope with improved resolution9US 5,500,527 A1996