H01J 2237/20228
Mechanical x-y scanning
Official title: Mechanical X-Y scanning
H01J2237/20228 (Mechanical x-y scanning) appears on 282 US grants and 282 published applications in this corpus.
Search patents in H01J- Granted patents
- 282
- Published applications
- 282
- Assignees
- 102
- Inventors
- 548
- Latest grant
- 26 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1993 | 4 | 0 |
| 1994 | 3 | 0 |
| 1995 | 2 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 6 | 0 |
| 1999 | 3 | 0 |
| 2000 | 6 | 0 |
| 2001 | 3 | 2 |
| 2002 | 4 | 13 |
| 2003 | 9 | 8 |
| 2004 | 8 | 12 |
| 2005 | 13 | 16 |
| 2006 | 18 | 6 |
| 2007 | 13 | 32 |
| 2008 | 13 | 17 |
| 2009 | 20 | 18 |
| 2010 | 9 | 2 |
| 2011 | 15 | 10 |
| 2012 | 8 | 11 |
| 2013 | 8 | 4 |
| 2014 | 9 | 12 |
| 2015 | 9 | 10 |
| 2016 | 7 | 5 |
| 2017 | 6 | 8 |
| 2018 | 10 | 6 |
| 2019 | 7 | 19 |
| 2020 | 20 | 16 |
| 2021 | 10 | 18 |
| 2022 | 12 | 6 |
| 2023 | 8 | 10 |
| 2024 | 9 | 6 |
| 2025 | 3 | 4 |
| 2026 | 4 | 11 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Autofocus method for single beam and multi-beam systems26 May 2026US 12,640,337 B2KLA Corporation
- Method of imaging a sample with a charged particle beam device, method of calibrating a charged particle beam device, and charged particle beam device24 Feb 2026US 12,562,336 B2APPLIED Materials.Inc.
- Method of determining an energy spectrum or energy width of a charged particle beam, and charged particle beam imaging device24 Feb 2026US 12,562,338 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Concurrent or cyclical etch and directional deposition10 Feb 2026US 12,550,637 B2APPLIED Materials.Inc.
- Charged particle microscope and stage4 Nov 2025US 12,463,004 B2Hitachi High-Tech Corporation
- System and method for adjusting an ion beam10 Sep 2026US 2026/0269182 A1APPLIED Materials.Inc.
- Vertically oriented implanter architecture for contactless backside substrate processing6 Aug 2026US 2026/0229445 A1
- Charged Particle Beam Device and Method for Producing and Observing Sample Piece6 Aug 2026US 2026/0229446 A1Hitachi High-Tech Corporation
- Ion implanter9 Jul 2026US 2026/0198260 A1Nissin Ion Equipment Co., Ltd.
- Collation system28 May 2026US 2026/0148929 A1NEC Corporation
Most cited
By later US patents
- Method for inspecting substrate, substrate inspecting system and electron beam apparatus113US 7,109,483 B2Ebara Corporation · 2006
- Semiconductor device tester which measures information related to a structure of a sample in a depth direction96US 6,768,324 B1Fab Solutions, Inc. · 2004
- Ion sources, systems and methods93US 7,554,096 B2ALIS Corporation · 2009
- Parallel link mechanism, exposure system and method of manufacturing the same, and method of manufacturing devices92US 6,940,582 B1Nikon Corporation · 2005
- Stage device and pattern transfer system using the same78US 5,684,856 ACanon Kabushiki Kaisha · 1997