Parallel link mechanism, exposure system and method of manufacturing the same, and method of manufacturing devices

An exposure apparatus that transfers a predetermined pattern of a mask onto a substrate, the exposure apparatus comprising:

• a projection system located between the mask and the substrate and adapted to project the predetermined pattern to the substrate;
• a mask stage adapted to hold the mask;
• a support mechanism that supports the projection system;
• and
• a parallel link mechanism comprising three rods adapted to control a relative position, in at least three degrees of freedom, of the mask stage, the parallel link mechanism linking the mask stage and a base member different from the support mechanism.

A method of making an exposure apparatus to transfer a pattern of a mask onto a substrate, comprising the steps of:

• providing a mask stage adapted to hold the mask;
• providing a projection optical system adapted to project a pattern of the mask onto a substrate;
• providing a substrate stage adapted to hold the substrate;
• providing a first parallel link mechanism that supports the projection optical system such that an attitude of the projection optical system is controllable;
• and
• providing a second parallel link mechanism that supports at least one of the mask stage and the substrate stage such that relative position, in at least three degrees of freedom, of at least one of the mask stage and the substrate stage with respect to the projection optical system is controllable, the second parallel link mechanism being isolated from the first parallel link mechanism.

A method of making an exposure apparatus to transfer a pattern of a mask onto a substrate, comprising the steps of:

• providing a mask stage adapted to hold the mask;
• providing a projection optical system adapted to project a pattern of the mask onto a substrate;
• providing a substrate stage adapted to hold the substrate;
• providing a first parallel link mechanism that supports the substrate stage, the first parallel link mechanism being connected to a first base member;
• and
• providing a second parallel link mechanism that supports the mask stage, the second parallel link mechanism being connected to a second base member different from the first base member, the second base member being larger than the first base member.

An exposure apparatus that transfers a predetermined pattern onto a substrate, the exposure apparatus comprising:

• a projection system located between the predetermined pattern and the substrate to project the predetermined pattern to the substrate;
• a sensor coupled to the projection system and configured to detect a surface of the substrate;
• a first parallel link mechanism comprising a plurality of rods configured to support the projection system such that an attitude of the projection system is controllable, the rods connected to an outer portion of the projection system;
• and
• a controller configured to control the first parallel link mechanism to adjust an attitude of the projection system in accordance with a condition of a surface on which the exposure apparatus is disposed.