H01J 2237/0492
Lens systems
H01J2237/0492 (Lens systems) appears on 298 US grants and 326 published applications in this corpus.
Search patents in H01J- Granted patents
- 298
- Published applications
- 326
- Assignees
- 108
- Inventors
- 530
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 4 | 0 |
| 1995 | 4 | 0 |
| 1996 | 3 | 0 |
| 1997 | 1 | 0 |
| 1998 | 4 | 0 |
| 1999 | 4 | 0 |
| 2000 | 1 | 0 |
| 2001 | 6 | 1 |
| 2002 | 1 | 1 |
| 2003 | 2 | 4 |
| 2004 | 6 | 4 |
| 2005 | 4 | 7 |
| 2006 | 6 | 12 |
| 2007 | 8 | 4 |
| 2008 | 8 | 11 |
| 2009 | 3 | 16 |
| 2010 | 6 | 7 |
| 2011 | 12 | 12 |
| 2012 | 14 | 16 |
| 2013 | 13 | 10 |
| 2014 | 15 | 11 |
| 2015 | 9 | 15 |
| 2016 | 12 | 13 |
| 2017 | 13 | 15 |
| 2018 | 14 | 12 |
| 2019 | 16 | 17 |
| 2020 | 15 | 24 |
| 2021 | 17 | 19 |
| 2022 | 22 | 16 |
| 2023 | 12 | 26 |
| 2024 | 15 | 19 |
| 2025 | 15 | 21 |
| 2026 | 8 | 13 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Aberration correction systems and charged particle microscope systems including the same29 Sep 2026US 12,749,644 B2FEI Company
- Charged particle beam device and specimen observation method15 Sep 2026US 12,738,442 B2Hitachi High-Tech Corporation
- Detector substrate for use in a charged particle multi-beam assessment tool11 Aug 2026US 12,706,272 B2ASML Netherlands B. V.
- Objective lens array assembly, electron-optical system, electron-optical system array, method of focusing4 Aug 2026US 12,700,566 B2ASML Netherlands B. V.
- Multi charged particle beam writing apparatus17 Mar 2026US 12,580,148 B2NuFlare Technology, Inc.
- Particle beam microscope24 Sep 2026US 2026/0290747 A1
- Charged particle beam energy width reduction apparatus, method of operating thereof, and charged particle beam device11 Jun 2026US 2026/0162924 A1ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Multiple charged-particle beam apparatus and methods of operating the same11 Jun 2026US 2026/0162932 A1ASML Netherlands B. V.
- Charged particle assessment tool, inspection method28 May 2026US 2026/0148935 A1ASML Netherlands B. V.
- Charged particle assessment tool, inspection method9 Apr 2026US 2026/0100324 A1ASML Netherlands B. V.
Most cited
By later US patents
- Pattern inspection apparatus and electron beam apparatus86US 5,557,105 AFujitsu Limited · 1996
- Ion beam lithography71US 4,985,634 AOesterreichische Investitionskredit Aktiengesellschaft and Ionen Mikrofabrications · 1991
- Charged particle beamlet exposure system64US 7,084,414 B2Mapper Lithography IP B.V. · 2006
- Multiple-beam system for high-speed electron-beam inspection52US 8,362,425 B2KLA-Tencor Corporation · 2013
- Apparatus of plural charged-particle beams51US 9,922,799 B2Hermes Microvision, Inc. · 2018