H01J 2237/04928
Telecentric systems
H01J2237/04928 (Telecentric systems) appears on 21 US grants and 18 published applications in this corpus.
Search patents in H01J- Granted patents
- 21
- Published applications
- 18
- Assignees
- 16
- Inventors
- 34
- Latest grant
- 23 Sep 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 2 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 2 | 1 |
| 2002 | 1 | 0 |
| 2003 | 1 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 1 |
| 2007 | 0 | 0 |
| 2008 | 1 | 0 |
| 2009 | 0 | 1 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 1 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 1 |
| 2018 | 1 | 1 |
| 2019 | 0 | 0 |
| 2020 | 1 | 3 |
| 2021 | 1 | 1 |
| 2022 | 2 | 3 |
| 2023 | 2 | 0 |
| 2024 | 2 | 2 |
| 2025 | 1 | 2 |
| 2026 | 0 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Apparatus of plural charged-particle beams23 Sep 2025US 12,424,408 B2ASML Netherlands B. V.
- Particle beam system and the use thereof for flexibly setting the current intensity of individual particle beams15 Oct 2024US 12,119,204 B2Carl Zeiss MultiSEM GmbH
- Method for operating a multiple particle beam system while altering the numerical aperture, associated computer program product and multiple particle beam system6 Aug 2024US 12,057,290 B2Carl Zeiss MultiSEM GmbH
- Apparatus of plural charged-particle beams18 Jul 2023US 11,705,304 B2ASML Netherlands B. V.
- Charged particle beam lithography system21 Mar 2023US 11,610,758 B2Kkt Holdings Syndicate
- Field curvature corrector for use in multi-electron-beam optical system12 Feb 2026US 2026/0045437 A1KLA Corporation
- Apparatus of plural charged-particle beams15 Jan 2026US 2026/0018376 A1ASML Netherlands B. V.
- Use of multiple electron beams for high throughput inspection28 Aug 2025US 2025/0273424 A1
- Multi-beam charged particle imaging system with improved imaging of secondary electron beamlets on a detector27 Mar 2025US 2025/0104966 A1
- Method for operating a multiple particle beam system while altering the numerical aperture, associated computer program product and multiple particle beam system17 Oct 2024US 2024/0347316 A1Carl Zeiss MultiSEM GmbH
Most cited
By later US patents
- Ion beam lithography71US 4,985,634 AOesterreichische Investitionskredit Aktiengesellschaft and Ionen Mikrofabrications · 1991
- Apparatus of plural charged-particle beams51US 9,922,799 B2Hermes Microvision, Inc. · 2018
- Multi-beam source33US 8,183,543 B2IMS Nanofabrication GmbH · 2012
- Projection imaging type electron microscope13US 7,423,268 B2Ebara Corporation · 2008
- Curvilinear variable axis lens correction with crossed coils12US 5,708,274 AInternational Business Machines Corporation · 1998