Method for operating a multiple particle beam system while altering the numerical aperture, associated computer program product and multiple particle beam system
AssigneeCarl Zeiss MultiSEM GmbH
InventorsHans Fritz, Ingo Mueller
Life of this patent
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Abstract
A method includes operating a multiple particle beam system at different working points. The numerical aperture can be set for each of the working points in such a way that the resolution of the multiple particle beam system is optimal. In the process, the beam pitch between adjacent individual particle beams on the sample to be scanned is kept constant as a boundary condition. There are no mechanical reconfigurations of the system whatsoever for the purposes of varying the numerical aperture.
Claims10
An electron-beam device, comprising upper-column electron optics and lower-column electron optics comprising:
- an aperture array to divide an electron beam into a plurality of electron beamlets;
- a lens array comprising a plurality of lenses to adjust the focus of the plurality of electron beamlets, wherein respective lenses of the plurality of lenses are to adjust the focus of respective electron beamlets of the plurality of electron beamlets;
- and
- a first macro-lens to adjust the focus of the plurality of electron beamlets in a manner opposite to the lens array;
- wherein the lens array is disposed between the aperture array and the first macro-lens.
A method, comprising, in the upper-column electron optics of an electron-beam device:
- dividing an electron beam into a plurality of electron beamlets using an aperture array;
- adjusting the focus of the plurality of electron beamlets using a lens array comprising a plurality of lenses, comprising using respective lenses of the plurality of lenses to adjust the focus of respective electron beamlets of the plurality of electron beamlets;
- and
- adjusting the focus of the plurality of electron beamlets using a first macro-lens, wherein:
- the first macro-lens lens adjusts the focus of the plurality of electron beamlets in a manner opposite to the lens array;
- and the lens array is disposed between the aperture array and the first macro-lens.
Dependencies are inferred from the claim text.