Multiple charged-particle beam apparatus and methods of operating the same
AssigneeASML Netherlands B.V.
InventorsXiaoyu JI, Weiming REN
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AssigneeASML Netherlands B.V.
InventorsXiaoyu JI, Weiming REN
Estimating the term…
Systems and methods of inspecting a sample using a multi charged-particle beam apparatus with enhanced probe current of beamlets are disclosed. The apparatus may include a charged-particle source, a first condenser lens configured to focus the plurality of charged-particle beams to form a beam crossover at a crossover point and a second condenser lens configured to collimate the focused plurality of charged-particle beams, wherein the crossover point is formed between the first and the second condenser lens along the primary optical axis, and wherein an adjustment of a position of the crossover point causes an adjustment of a beam sizes of the plurality of charged-particle beams. The position of the crossover point may be adjusted by varying the excitation of one or more condenser lenses, or by electrically moving the principal plane positions of one or more condenser lenses.
A multiple charged-particle beam apparatus comprising:
A non-transitory computer readable medium storing a set of instructions that is executable by one or more processors of a multiple charged-particle beam apparatus to cause the charged particle beam apparatus to perform a method comprising:
The non-transitory computer readable medium of claim 19, wherein the set of instructions that is executable by one or more processors of the multiple charged-particle beam apparatus causes the multiple charged-particle beam apparatus to further perform adjusting an excitation of the second condenser lens based on the excitation of the first condenser lens.
Dependencies are inferred from the claim text.