H01J 2237/04926
Combined
Official title: combined
H01J2237/04926 (Combined) appears on 39 US grants and 50 published applications in this corpus.
Search patents in H01J- Granted patents
- 39
- Published applications
- 50
- Assignees
- 22
- Inventors
- 91
- Latest grant
- 4 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 1 | 4 |
| 2010 | 0 | 0 |
| 2011 | 2 | 0 |
| 2012 | 1 | 2 |
| 2013 | 1 | 1 |
| 2014 | 0 | 2 |
| 2015 | 1 | 4 |
| 2016 | 4 | 2 |
| 2017 | 0 | 2 |
| 2018 | 2 | 2 |
| 2019 | 2 | 2 |
| 2020 | 3 | 8 |
| 2021 | 6 | 2 |
| 2022 | 3 | 4 |
| 2023 | 2 | 4 |
| 2024 | 4 | 7 |
| 2025 | 1 | 2 |
| 2026 | 3 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Objective lens array assembly, electron-optical system, electron-optical system array, method of focusing4 Aug 2026US 12,700,566 B2ASML Netherlands B. V.
- Multi charged particle beam writing apparatus17 Mar 2026US 12,580,148 B2NuFlare Technology, Inc.
- Charged particle optics, charged particle beam apparatus, and method for scanning a charged particle beam3 Feb 2026US 12,542,253 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Apparatus of plural charged-particle beams23 Sep 2025US 12,424,408 B2ASML Netherlands B. V.
- Particle beam system and the use thereof for flexibly setting the current intensity of individual particle beams15 Oct 2024US 12,119,204 B2Carl Zeiss MultiSEM GmbH
- Charged particle beam energy width reduction apparatus, method of operating thereof, and charged particle beam device11 Jun 2026US 2026/0162924 A1ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Apparatus of plural charged-particle beams15 Jan 2026US 2026/0018376 A1ASML Netherlands B. V.
- Lens arrangement in an electron microscopy system11 Dec 2025US 2025/0379024 A1
- A multi-mode low-voltage electron microscope10 Jul 2025US 2025/0226173 A1Delong Instruments A.S.
- Method for operating a multiple particle beam system while altering the numerical aperture, associated computer program product and multiple particle beam system17 Oct 2024US 2024/0347316 A1Carl Zeiss MultiSEM GmbH
Most cited
By later US patents
- Multiple-beam system for high-speed electron-beam inspection52US 8,362,425 B2KLA-Tencor Corporation · 2013
- Apparatus of plural charged-particle beams51US 9,922,799 B2Hermes Microvision, Inc. · 2018
- Objective lens arrangement usable in particle-optical systems33US 10,622,184 B2Applied Materials Israel Ltd. · 2020
- Charged particle inspection method and charged particle system32US 10,354,831 B2Applied Materials Israel Ltd. · 2019
- Charged particle-optical systems, methods and components21US 8,039,813 B2Applied Materials Israel Ltd. · 2011