Multi charged particle beam writing apparatus

A multi charged particle beam writing apparatus comprising:

• a plurality of blankers performing blanking deflection on each of beams in a multi charged particle beam;
• a limiting aperture member blocking a beam in the multi charged particle beam, the beam being deflected by the blanker to achieve a beam-OFF state;
• two or more-stage objective lenses each comprised of a magnetic lens, and configured to focus the multi charged particle beam on a substrate, which has passed through the limiting aperture member;
• three or more correction lenses correcting an imaging state of the multi charged particle beam on the substrate;
• and
• an electric field control electrode to which a positive constant voltage with respect to the substrate is applied, the electric field control electrode generating an electric field between the substrate and the electric field control electrode,
• wherein the two or more-stage objective lenses include a first objective lens, and a second objective lens placed most downstream in a travel direction of the multi charged particle beam, and
• the three or more correction lenses are placed upstream of a lens magnetic field of the second objective lens in the travel direction of the multi charged particle beam.