H01J 2237/04924
Electrostatic
Official title: electrostatic
H01J2237/04924 (Electrostatic) appears on 87 US grants and 100 published applications in this corpus.
Search patents in H01J- Granted patents
- 87
- Published applications
- 100
- Assignees
- 42
- Inventors
- 154
- Latest grant
- 11 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 2 | 0 |
| 1999 | 2 | 0 |
| 2000 | 0 | 0 |
| 2001 | 3 | 0 |
| 2002 | 0 | 0 |
| 2003 | 1 | 3 |
| 2004 | 3 | 1 |
| 2005 | 1 | 2 |
| 2006 | 0 | 0 |
| 2007 | 1 | 2 |
| 2008 | 0 | 5 |
| 2009 | 1 | 3 |
| 2010 | 2 | 1 |
| 2011 | 2 | 6 |
| 2012 | 6 | 6 |
| 2013 | 2 | 3 |
| 2014 | 7 | 5 |
| 2015 | 3 | 2 |
| 2016 | 2 | 5 |
| 2017 | 8 | 7 |
| 2018 | 3 | 3 |
| 2019 | 5 | 2 |
| 2020 | 4 | 7 |
| 2021 | 4 | 6 |
| 2022 | 5 | 7 |
| 2023 | 5 | 10 |
| 2024 | 6 | 7 |
| 2025 | 4 | 3 |
| 2026 | 2 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Detector substrate for use in a charged particle multi-beam assessment tool11 Aug 2026US 12,706,272 B2ASML Netherlands B. V.
- Charged particle assessment tool, inspection method10 Feb 2026US 12,548,735 B2ASML Netherlands B. V.
- Charged particle assessment tool, inspection method23 Dec 2025US 12,505,978 B2ASML Netherlands B. V.
- Energy filter, and energy analyzer and charged particle beam device provided with same28 Oct 2025US 12,456,597 B2Hitachi High-Tech Corporation
- Apparatus of plural charged-particle beams23 Sep 2025US 12,424,408 B2ASML Netherlands B. V.
- Charged particle assessment tool, inspection method28 May 2026US 2026/0148935 A1ASML Netherlands B. V.
- Charged particle assessment tool, inspection method26 Mar 2026US 2026/0088249 A1ASML Netherlands B. V.
- Ion stripping apparatus with integrated quadrupoles5 Feb 2026US 2026/0038763 A1Axcelis Technologies, Inc.
- Apparatus of plural charged-particle beams15 Jan 2026US 2026/0018376 A1ASML Netherlands B. V.
- Apparatus for removing static electricity of semiconductor substrate17 Apr 2025US 2025/0125139 A1Nextin, Inc.
Most cited
By later US patents
- Pattern inspection apparatus and electron beam apparatus86US 5,557,105 AFujitsu Limited · 1996
- Apparatus of plural charged-particle beams51US 9,922,799 B2Hermes Microvision, Inc. · 2018
- Multiple beam charged particle optical system42US 8,134,135 B2Mapper Lithography IP B.V. · 2012
- Apparatus of plural charged-particle beams33US 10,643,820 B2Hermes Microvision, Inc. · 2020
- Multi-beam multi-column electron beam inspection system33US 6,734,428 B2Multibeam Systems, Inc. · 2004