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AssigneeMapper Lithography IP B.V.
InventorsPieter Kruit, Yanxia Zhang, Martijn J. Van Bruggen, Stijn Willem Herman Karel Steenbrink
Estimating the term…
The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
A multiple beam charged particle optical system, comprising a diverging charged particle beam part, an electrostatic lens structure with at least two electrodes which form at least one lens and a lens field, said lens structure provided with lens apertures, wherein the lens structure is included within said diverging beam part, and wherein the at least two electrodes are spaced apart a distance smaller than the diameter of said at least one lens.
Multiple beam charged particle optical system, comprising a charged particle beam source for emitting a beam of charged particles, an electrostatic lens structure comprising a first electrode and a second electrode aligned with each other, both electrodes provided with apertures, wherein the lens structure is included within said beam, and wherein a diameter of the apertures of the first electrode is smaller than a thickness of the first electrode and/or the diameter of the apertures of the second electrode is smaller than a thickness of the second electrode.
A multiple beam charged particle optical system, comprising a diverging charged particle beam part, an electrostatic lens structure with at least two electrodes, provided with lens apertures, wherein the lens structure is included within said beam part, and wherein the two electrodes are spaced apart a distance smaller than the diameter of said aperture, wherein the diameter of at least one lens aperture is made smaller than the thickness of the corresponding electrode and wherein a diameter of a lens aperture related to a lens field increases with the distance of the corresponding lens aperture to a center point of said electrode.
Dependencies are inferred from the claim text.