G03F 7/0046
With perfluoro compounds
Official title: {with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence)}
G03F7/0046 (With perfluoro compounds) appears on 1,898 US grants and 2,646 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,898
- Published applications
- 2,646
- Assignees
- 286
- Inventors
- 2,285
- Latest grant
- 11 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 2 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 2 | 0 |
| 1989 | 3 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 4 | 0 |
| 1993 | 2 | 0 |
| 1994 | 1 | 0 |
| 1995 | 3 | 0 |
| 1996 | 1 | 0 |
| 1997 | 3 | 0 |
| 1998 | 2 | 0 |
| 1999 | 2 | 0 |
| 2000 | 7 | 0 |
| 2001 | 3 | 4 |
| 2002 | 9 | 41 |
| 2003 | 13 | 87 |
| 2004 | 59 | 82 |
| 2005 | 54 | 93 |
| 2006 | 49 | 94 |
| 2007 | 64 | 86 |
| 2008 | 57 | 90 |
| 2009 | 70 | 107 |
| 2010 | 73 | 146 |
| 2011 | 76 | 142 |
| 2012 | 92 | 213 |
| 2013 | 131 | 163 |
| 2014 | 177 | 149 |
| 2015 | 190 | 135 |
| 2016 | 145 | 170 |
| 2017 | 133 | 119 |
| 2018 | 85 | 82 |
| 2019 | 93 | 68 |
| 2020 | 66 | 73 |
| 2021 | 45 | 69 |
| 2022 | 45 | 50 |
| 2023 | 56 | 46 |
| 2024 | 34 | 104 |
| 2025 | 30 | 132 |
| 2026 | 13 | 101 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Salt, acid generator, resist composition and method for producing resist pattern11 Aug 2026US 12,704,781 B2Sumitomo Chemical Company, Limited
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device16 Jun 2026US 12,656,684 B2FUJIFILM Corporation
- Crosslinkable photoresist for extreme ultraviolet lithography5 May 2026US 12,619,148 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Lithography techniques for reducing defects5 May 2026US 12,619,154 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Polymer compositions having photoacid generators and photoresists21 Apr 2026US 12,607,933 B2Dupont Electronics, Inc.
- Resist composition, resist pattern formation method, compound, and polymer compound8 Oct 2026US 2026/0310077 A1Tokyo Ohka Kogyo.Co., Ltd.
- Resist composition and resist pattern formation method1 Oct 2026US 2026/0299410 A1Tokyo Ohka Kogyo.Co., Ltd.
- Preparation of polymer, preparation of chemically amplified resist composition, resist pattern forming process, polymer, and chemically amplified resist composition3 Sep 2026US 2026/0259497 A1Shin-Etsu Chemical Co., Ltd.
- Resist composition, resist pattern formation method, fluorine-containing polymer compound, and compound20 Aug 2026US 2026/0244098 A1Tokyo Ohka Kogyo.Co., Ltd.
- Resist composition, resist pattern formation method, compound, and polymer compound13 Aug 2026US 2026/0235949 A1Tokyo Ohka Kogyo.Co., Ltd.
Most cited
By later US patents
- Photodecomposable bases and photoresist compositions470US 8,614,047 B2International Business Machines Corporation · 2013
- Photosensitive material and method of lithography178US 9,213,234 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2015
- Polymer, resist composition, and patterning process146US 7,537,880 B2Shin-Etsu Chemical Co., Ltd. · 2009
- Process for generating negative tone resist images utilizing carbon dioxide critical fluid87US 5,665,527 AInternational Business Machines Corporation · 1997
- Photodefinable polymers containing perfluorocyclobutane groups80US 5,426,164 AThe Dow Chemical Company · 1995