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US 9,213,234 B2Granted
Photosensitive material and method of lithography
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorChing-Yu Chang
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Abstract
Photosensitive materials and method of forming a pattern that include providing a composition of a component of a photosensitive material that is operable to float to a top region of a layer formed from the photosensitive material. In an example, a photosensitive layer includes a first component having a fluorine atom (e.g., alkyl fluoride group). After forming the photosensitive layer, the first component floats to a top surface of the photosensitive layer. Thereafter, the photosensitive layer is patterned.
Claims8
A method, comprising:
- providing a photosensitive material that includes a solvent, a photoacid generator, and a quencher having an alkyl fluoride group of C2F5 linked to the quencher;
- depositing the photosensitive material onto a semiconductor substrate;
- while the photosensitive material is disposed on the semiconductor substrate, floating the quencher having the alkyl functional group of C2F5 from a lower region to an upper region of a layer comprising the photosensitive material, wherein the floating quencher has the formula
- wherein R4, R5 and R6 are alkyl fluoride and one of R4, R5, and R6 is the C2F5 component;
- thereafter, exposing the layer of photosensitive material to a radiation beam;
- wherein the upper region has a lower amount of acid from the photoacid generator than the lower region after the exposing of the layer;
- and
- developing the exposed layer.
5 more elements
A method, comprising:
- providing a photosensitive material that includes a solvent, a photoacid generator, and a quencher having an alkyl fluoride group linked to the quencher;
- depositing the photosensitive material onto a semiconductor substrate;
- while the photosensitive material is disposed on the semiconductor substrate, floating the quencher having the alkyl functional group of C2F5 from a lower region to an upper region of a layer comprising the photosensitive material, wherein the floating quencher has the formula
- wherein R12 has the C2F5 component, thereafter, exposing the layer of photosensitive material to a radiation beam;
- wherein the upper region has a lower amount of acid than the lower region after the exposing of the layer;
- and
- developing the exposed layer.
4 more elements
Dependencies are inferred from the claim text.