Photodecomposable bases and photoresist compositions
AssigneesInternational Business Machines Corporation, Jsr Corporation
InventorsRamakrishnan Ayothi, William D. Hinsberg, Sally A. Swanson, Gregory M. Wallraff
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Abstract
Provided are novel symmetrical and asymmetrical bifunctional photodecomposable bases (PDBs) with dicarboxylate anion groups that show increased imaging performance. Also provided are photoresist compositions prepared with the bifunctional dicarboxylated PDBs and lithography methods that use the photoresist compositions of the present invention.
Claims29
A composition comprising at least one dicarboxylate anion photodecomposable base (PDB), a resist polymer, and pinane acetate p-toluenesulfonate as an acid amplifier, wherein the PDB is fluorinated and/or asymmetrical.
A composition comprising:
- at least one dicarboxylate anion photodecomposable base (PDB) having at least one structure selected from the group consisting of Structures 3, 4, and 6:
- a resist polymer;
- and pinane acetate p-toluenesulfonate as an acid amplifier.
A composition comprising at least one dicarboxylate anion photodecomposable base (PDB) comprising bis(triphenylsulfonium) tetrafluorodiglycolic acid (BisTPS TFDGA).
A composition comprising at least one dicarboxylate anion photodecomposable base (PDB), wherein the PDB has a structure selected from the group consisting of Structures (1), (4)-(7), (9) and (10):
- .
Dependencies are inferred from the claim text.