Resist composition, resist pattern formation method, fluorine-containing polymer compound, and compound

A fluorine-containing polymer compound having a structural unit (f0) derived from a compound represented by the following General Formula (f0-1):

• wherein W1 is a polymerizable group, Ar is an aromatic ring, Xf is an iodine atom or a substituent containing an iodine atom, m1 is an integer of 1 or more as long as the valence allows, Lf01 is a single bond or an (n1+1)-valent linking group, Rf01 is a fluorinated alkyl group having 1 to 12 carbon atoms, Rf02 is an organic group having 1 to 12 carbon atoms which may have a fluorine atom or a hydrogen atom, n1 is an integer of 1 to 3, Rf03 is a substituent other than an iodine atom, and m2 is an integer of 0 or more as long as the valence allows.

A compound represented by the following General Formula (f0-1):

• wherein W1 is a polymerizable group, Ar is an aromatic ring, Xf is an iodine atom or a substituent containing an iodine atom, m1 is an integer of 1 or more as long as the valence allows, Lf01 is a single bond or an (n1+1)-valent linking group, Rf01 is a fluorinated alkyl group having 1 to 12 carbon atoms, Rf02 is an organic group having 1 to 12 carbon atoms which may have a fluorine atom or a hydrogen atom, n1 is an integer of 1 to 3, Rf03 is a substituent other than an iodine atom, and m2 is an integer of 0 or more as long as the valence allows.