G03F 1/64
Characterised by the frames
Official title: characterised by the frames, e.g. structure or material, including bonding means therefor
G03F1/64 (Characterised by the frames) appears on 545 US grants and 614 published applications in this corpus.
Search patents in G03F- Granted patents
- 545
- Published applications
- 614
- Assignees
- 129
- Inventors
- 951
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 3 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 2 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 0 | 0 |
| 1994 | 8 | 0 |
| 1995 | 5 | 0 |
| 1996 | 4 | 0 |
| 1997 | 4 | 0 |
| 1998 | 10 | 0 |
| 1999 | 5 | 0 |
| 2000 | 6 | 0 |
| 2001 | 11 | 7 |
| 2002 | 14 | 14 |
| 2003 | 15 | 18 |
| 2004 | 21 | 23 |
| 2005 | 12 | 17 |
| 2006 | 13 | 18 |
| 2007 | 11 | 11 |
| 2008 | 10 | 11 |
| 2009 | 7 | 14 |
| 2010 | 8 | 16 |
| 2011 | 10 | 22 |
| 2012 | 15 | 12 |
| 2013 | 19 | 11 |
| 2014 | 9 | 8 |
| 2015 | 8 | 16 |
| 2016 | 15 | 22 |
| 2017 | 23 | 24 |
| 2018 | 23 | 49 |
| 2019 | 26 | 27 |
| 2020 | 35 | 40 |
| 2021 | 42 | 35 |
| 2022 | 30 | 50 |
| 2023 | 26 | 50 |
| 2024 | 42 | 47 |
| 2025 | 31 | 31 |
| 2026 | 17 | 21 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Pellicle holding module, pellicle thermal durability evaluation device comprising same, and pellicle thermal durability evaluation method25 Aug 2026US 12,717,226 B2Iucf-Hyu (Industry-University Cooperation Foundation Hanyang University)
- Methods of manufacturing a pellicle having graphite layer4 Aug 2026US 12,699,315 B2Research & Business Foundation Sungkyunkwan University
- Agglutinant for pellicles, pellicle frame with agglutinant layer, pellicle, exposure original plate with pellicle, exposure method, method for producing semiconductor, and method for producing liquid crystal display board7 Jul 2026US 12,675,041 B2Shin-Etsu Chemical Co., Ltd.
- System and method for reducing pellicle rupture23 Jun 2026US 12,663,708 B2Intel Corporation
- Pellicle and method of manufacturing thereof23 Jun 2026US 12,663,709 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Pellicle frame, pellicle, and exposure plate with pellicle, and method for producing pellicle frame, exposure method, method for producing semiconductor device, and method for producing liquid-crystal display panel24 Sep 2026US 2026/0287996 A1Nippon Light Metal Company, Ltd.
- Pellicle and method of manufacturing thereof24 Sep 2026US 2026/0287997 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Euv pellicle with structured ventilation frame10 Sep 2026US 2026/0267220 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Methods of manufacturing pellicle for euv lithography masks20 Aug 2026US 2026/0244089 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Nanotube pellicle film, pellicle, exposure original plate, and exposure device20 Aug 2026US 2026/0244092 A1Mitsui Chemicals, Inc.
Most cited
By later US patents
- Method of making an extreme ultraviolet pellicle378US 9,256,123 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2016
- Protective device for photographic masks48US 4,833,051 ANippon Kogaku K. K. · 1989
- System for using a two part cover for protecting a reticle40US 6,906,783 B2ASML Holding N. V. · 2005
- Removable pellicle for lithographic mask protection and handling36US 6,492,067 B1Euv LLC · 2002
- Removable pellicle and method34US 4,737,387 A1988