US 12,663,709 B2 · Pellicle and method of manufacturing thereof

Abstract

A pellicle for an EUV photo mask includes a membrane attached to a frame. The membrane includes nanotubes, Ru—O—X catalyst structures partially covering a surface of each nanotube, and a protection layer to cover the Ru—O—X catalyst structures and the surface of each nanotube. X is a metal element of Mo, Ti, Zr or Nb. The Ru—O—X catalyst structures include first nano-particles of a X-containing material formed on the surface of each nanotube, and second nano-particles of a Ru-containing material formed on the first nano-particles, thereby forming catalysts or catalyst bridges. The pellicle advantageously has high EUV light transmittance and improved endurance against attacking particles (such as hydrogen particles), thereby having prolonged lifetime.

Claims20

Dependent claims

A method of manufacturing a pellicle for an extreme ultraviolet (EUV) photo mask, comprising:

forming a plurality of nanotubes made of a nanotube material to form a membrane;
forming functional groups to at least partially cover a surface of each nanotube of the plurality of nanotubes;
forming a plurality of first nano-particles made of a first material over the plurality of nanotubes;
forming a plurality of second nano-particles made of a second material in contact with the plurality of first nano-particles;
forming a first protection layer made of a first capping material to cover the plurality of first nano-particles, the plurality of second nano-particles, and the surface of each nanotube;
and
attaching the membrane to a pellicle frame.

4 more elements

Dependencies are inferred from the claim text.

Pellicle and method of manufacturing thereof

Life of this patent

Pellicle and method of manufacturing thereof

Life of this patent

Abstract

Claims20