Methods of manufacturing a pellicle having graphite layer
AssigneesSamsung Electronics Co., Ltd., Research & Business Foundation Sungkyunkwan University
InventorsMun Ja Kim, Ji-Beom Yoo, Qicheng Hu, Changyoung Jeong, Ki-Bong Nam, Jin-Ho Yeo
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Abstract
A method for manufacturing a pellicle according to the technical idea of the present invention includes preparing a support substrate, forming a catalyst layer including nickel (Ni) in which one selected from a (110) plane and a (100) plane is a dominant crystal plane, on the support substrate, and performing a chemical vapor deposition process on the catalyst layer at about 1050° C. or less to form a membrane having a graphite layer.
Claims16
A method for manufacturing a pellicle, the method comprising:
- preparing a support substrate;
- forming a catalyst layer on the support substrate, the catalyst layer including nickel (Ni) in which a (110) plane is a dominant crystal plane;
- and
- performing a chemical vapor deposition process on the catalyst layer at about 1050° C. or less to form a membrane having a graphite layer,
- wherein a first surface roughness of the catalyst layer before forming the membrane is about 5 nm to about 15 nm,
- wherein a second surface roughness of the catalyst layer after forming the membrane is about 20 nm to about 35 nm,
- wherein the membrane is used in lithography equipment using extreme ultraviolet (EUV) light as a light source,
- wherein in the membrane, a transmittance of the EUV light is about 80% or more, and a reflectance of the EUV light is about 0.04% or less, and
- wherein the graphite layer of the membrane has a polycrystalline structure, and a polycrystal grain size is about 1 μm or less.
A method for manufacturing a pellicle, the method comprising:
- preparing a nickel (Ni) foil;
- forming a catalyst layer on the nickel (Ni) foil, the catalyst layer including nickel (Ni), in which a (110) plane is a dominant crystal plane;
- performing a chemical vapor deposition process on the catalyst layer at about 1050° C. or less to form a membrane having a graphite layer;
- and
- removing the nickel (Ni) foil,
- wherein a first surface roughness of the catalyst layer before forming the membrane is from about 5 nm to about 15 nm, and
- wherein a second surface roughness of the catalyst layer after forming the membrane is about 20 nm to about 35 nm,
- wherein the membrane is used in lithography equipment using extreme ultraviolet (EUV) light as a light source, and
- wherein in the membrane, a transmittance of the EUV light is about 80% or more, and a reflectance of the EUV light is about 0.04% or less, and
- wherein the graphite layer of the membrane has a polycrystalline structure, and a polycrystal grain size is about 1 μm or less.
A method of manufacturing a pellicle for extreme ultraviolet (EUV) exposure used in lithography equipment using EUV light as a light source, the method comprising:
- preparing a support substrate;
- forming a catalyst layer on the support substrate, the catalyst layer including nickel (Ni), in which a (110) plane is a dominant crystal plane;
- forming a membrane having a graphite layer on the catalyst layer by performing a chemical vapor deposition process using a hydrocarbon-based precursor at about 1050° C. or less;
- and
- transferring the membrane having the graphite layer onto a frame,
- wherein a first surface roughness of the catalyst layer before forming the membrane is from about 5 nm to about 15 nm,
- wherein a second surface roughness of the catalyst layer after forming the membrane is about 20 nm to about 35 nm,
- wherein in the membrane, a transmittance of the EUV light is about 80% or more, and a reflectance of the EUV light is about 0.04% or less, and
- wherein the graphite layer of the membrane has a polycrystalline structure, and a polycrystal grain size is about 1 μm or less.
Dependencies are inferred from the claim text.