Protective device for photographic masks
AssigneeNippon Kogaku K.K.
InventorKazunori Imamura
Life of this patent
Estimating the term…
Abstract
A protective device for photographic masks or reticles used in the photolithographic operation for fabricating semiconductor devices. The protective device includes a frame having a protective pellicle attached thereover and the frame includes temporary fastening means for detachably fastening the frame to a mask substrate. The temporary fastening is effected by using for example vacuum chucking, magnetic attractive force or spring force. The frame may be formed with vent holes each having a filter so that the internal pressure of the space enclosed by the pellicle and the frame on the mask is made equal to the outside air pressure.
Claims8
A device for protecting a surface of a transparent substrate having a pattern of opaque and transparent areas, comprising:
- at least one frame means arranged on one surface of said substrate to enclose said pattern, said frame means having one peripheral edge thereof positioned at a predetermined distance from the surface of said substrate and the other peripheral edge thereof uniformly contacting the surface of said substrate;
- a transparent pellicle attached over said one peripheral edge of said frame means to cover the surface of said substrate including said pattern;
- and
- a pair of magnetic means oppositely arranged on the one and other surfaces of said substrate to produce a magnetic attractive force therebetween, one of said magnetic means being fixedly mounted on said frame means.
A device for protecting a surface of transparent substrate having a pattern of opaque and transparent areas, comprising:
- frame means arranged on the surface of said substrate to enclose said pattern, said frame means having one peripheral edge which lies in a plane substantially parallel with the surface of said substrate and is positioned at a predetermined distance from the surface of said substrate and the other peripheral edge uniformly contacting the surface of said substrate;
- a transparent pellicle attached over said one peripheral edge of said frame means to cover the surface of said substrate, including said pattern;
- means for securing the surface of said substrate with said other peripheral edge of said frame means;
- ventilation means provided on said frame means for enabling communication between a space between said substrate and said pellicle and bounded by said frame means on its periphery and a surrounding space;
- and
- filter means disposed between said enclosed space and said surrounding space for preventing dust from entering into said enclosed space through said ventilation means.
Dependencies are inferred from the claim text.