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US 2026/0244089 A1Published application
Methods of manufacturing pellicle for euv lithography masks
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsTing-Pi SUN, Pei-Cheng HSU, Hsin-Chang LEE
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Abstract
In a method of manufacturing a pellicle for an extreme ultraviolet (EUV) photomask, a nanotube layer including a plurality of carbon nanotubes is formed, the nanotube layer is attached to a pellicle frame, and a solvent dipping treatment is performed to the nanotube layer by applying bubbles in a solvent to the nanotube layer.
Claims20
A method of manufacturing a semiconductor device, comprising:
- forming a photo resist layer over a target layer;
- generating radiation and directing it toward a photomask including a pellicle;
- exposing the photo resist layer to a patterned radiation reflected from the photomask;
- developing the photo resist layer to form a pattern;
- etching the target layer with the pattern;
- demounting the pellicle from the photomask;
- and
- performing a solvent dipping treatment on the pellicle by applying bubbles in a solvent on a nanotube layer of the pellicle,
- wherein the bubbles are generated by pulsed laser or by injecting gas or a mixture of gas and liquid into the solvent.
6 more elements
A method of treating a pellicle for a photomask, comprising:
- attaching the pellicle to the photomask;
- exposing the photomask to radiation;
- detaching the pellicle from the photomask;
- performing a solvent dipping treatment on the pellicle by applying bubbles in a solvent on a nanotube layer of the pellicle, wherein the bubbles are generated by pulsed laser or by injecting gas or a mixture of gas and liquid into the solvent;
- and
- reattaching the pellicle to the photomask.
3 more elements
A method of manufacturing a pellicle for an extreme ultraviolet (EUV) photomask, comprising:
- forming a membrane comprising single carbon nanotubes;
- attaching the membrane to a pellicle frame;
- performing a solvent dipping treatment on the membrane by applying bubbles in a solvent, thereby forming a plurality of bundles of carbon nanotubes;
- and
- heating the membrane at a temperature in a range from 300° C. to 1000° C. in an inert gas ambient.
2 more elements
Dependencies are inferred from the claim text.