G01N 23/22
Investigating or analysing materials by the use of wave or particle radiation
Official title: by measuring secondary emission from the material
G01N23/22 (Investigating or analysing materials by the use of wave or particle radiation) appears on 3,436 US grants and 3,598 published applications in this corpus.
Search patents in G01N- Granted patents
- 3,436
- Published applications
- 3,598
- Assignees
- 1,334
- Inventors
- 7,286
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 21 | 0 |
| 1977 | 15 | 0 |
| 1978 | 14 | 0 |
| 1979 | 13 | 0 |
| 1980 | 12 | 0 |
| 1981 | 18 | 0 |
| 1982 | 19 | 0 |
| 1983 | 16 | 0 |
| 1984 | 20 | 0 |
| 1985 | 16 | 0 |
| 1986 | 18 | 0 |
| 1987 | 25 | 0 |
| 1988 | 17 | 0 |
| 1989 | 23 | 0 |
| 1990 | 16 | 0 |
| 1991 | 23 | 0 |
| 1992 | 18 | 0 |
| 1993 | 19 | 0 |
| 1994 | 22 | 0 |
| 1995 | 20 | 0 |
| 1996 | 31 | 0 |
| 1997 | 20 | 0 |
| 1998 | 27 | 0 |
| 1999 | 24 | 0 |
| 2000 | 32 | 0 |
| 2001 | 35 | 11 |
| 2002 | 59 | 72 |
| 2003 | 79 | 82 |
| 2004 | 67 | 91 |
| 2005 | 71 | 109 |
| 2006 | 94 | 154 |
| 2007 | 110 | 99 |
| 2008 | 110 | 147 |
| 2009 | 105 | 114 |
| 2010 | 91 | 71 |
| 2011 | 91 | 88 |
| 2012 | 67 | 87 |
| 2013 | 95 | 108 |
| 2014 | 97 | 149 |
| 2015 | 100 | 142 |
| 2016 | 117 | 118 |
| 2017 | 140 | 174 |
| 2018 | 120 | 133 |
| 2019 | 137 | 175 |
| 2020 | 164 | 209 |
| 2021 | 178 | 223 |
| 2022 | 169 | 228 |
| 2023 | 162 | 239 |
| 2024 | 173 | 228 |
| 2025 | 181 | 209 |
| 2026 | 125 | 138 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- G01N 23/225Using electron or ion1,648
- G01N 23/223By irradiating the sample with x-rays or gamma-rays and by measuring x-ray1,172
- G01N 23/227Measuring photoelectric effect240
- G01N 23/221By activation analysis192
- G01N 23/2206Combination of two or more measurements, at least one measurement being that175
- G01N 23/2204Specimen supports therefor168
- G01N 23/2202Preparing specimens therefor87
- G01N 23/2209Using wavelength dispersive spectroscopy [wds]62
Recent patents
- Overlay target measurement and shift compensation in charged particle systems and related methods6 Oct 2026US 12,754,150 B2Applied Materials Israel Ltd.
- System and method for approximating X-ray intensities for a sample measured by an X-ray detection system6 Oct 2026US 12,754,151 B2Bruker AXS GmbH
- Apparatus for analyzing composition and method thereof6 Oct 2026US 12,754,152 B23I Solution Inc.
- Method and system for determining physical properties of rocky formations6 Oct 2026US 12,754,153 B2Geolog S.r.l.
- XRF analyzer with improved resolution by using micro-reset6 Oct 2026US 12,754,329 B2Evident Scientific, Inc.
- Sample preparation system for electron microscopy8 Oct 2026US 2026/0309653 A1The Regents of the University of California
- Systems And Method for Interpreting High Energy Interactions8 Oct 2026US 2026/0309654 A1Decision Tree, LLC
- Method for measuring defects in two-component compound wafer and apparatus thereof8 Oct 2026US 2026/0309655 A1SK Siltron Co., Ltd.
- In situ and tunable deposition of a film1 Oct 2026US 2026/0297727 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Hybrid x-ray and optical metrology and navigation24 Sep 2026US 2026/0287527 A1Tokyo Electron Limited
Most cited
By later US patents
- Thiol labeling of DNA for attachment to gold surfaces400US 5,472,881 AUniversity of Utah Research Foundation · 1995
- Single beam photoneutron probe and X-ray imaging system for contraband detection and identification336US 5,838,759 AAdvanced Research and Applications Corporation · 1998
- Device and method for analyzing an organic sample265US 8,263,933 B2Carl Zeiss NTS GmbH · 2012
- Apparatus and methods for inspecting wafers and masks using multiple charged-particle beams156US 5,892,224 ANikon Corporation · 1999
- Wafer pattern defect detection method and apparatus therefor138US 5,576,833 AKabushiki Kaisha Toshiba · 1996