Overlay target measurement and shift compensation in charged particle systems and related methods
AssigneeApplied Materials Israel Ltd.
InventorsIgor Isakov, Assaf Duvdevan, Harel Azulay, Udi Abrahamov
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AssigneeApplied Materials Israel Ltd.
InventorsIgor Isakov, Assaf Duvdevan, Harel Azulay, Udi Abrahamov
Estimating the term…
A method and system that compensate for differences in response times of different types of sensors of a charged particle system. This involves obtaining first and second secondary electron images and backscattered electron images of an overlay target, scanned with an illuminating electron beam in accordance with first and second scan patterns. A secondary electron shift and a backscattered electron shift are determined based on a registration between the first and a rotated second images. A compensation shift is determined based on these shifts. The images are acquired using a pixel grab period lower than a response period of a backscattered electron sensor used to generate the first backscattered electron image.
A method for compensating for differences in response times of different types of sensors of a charged particle system, the method comprising:
A system for compensating for response times of different types of sensors of a charged particle system, the system comprising:
A non-transitory computer readable medium for compensating for differences in response times of different types of sensors of a charged particle system, the non-transitory computer readable medium having instructions stored thereon that, when executed by a processor, cause a system to:
Dependencies are inferred from the claim text.