G01N 23/225
Using electron or ion
Official title: using electron or ion
G01N23/225 (Using electron or ion) appears on 1,648 US grants and 1,906 published applications in this corpus.
Search patents in G01N- Granted patents
- 1,648
- Published applications
- 1,906
- Assignees
- 583
- Inventors
- 3,694
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 1 | 0 |
| 1978 | 3 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 2 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 5 | 0 |
| 1985 | 0 | 0 |
| 1986 | 2 | 0 |
| 1987 | 2 | 0 |
| 1988 | 5 | 0 |
| 1989 | 7 | 0 |
| 1990 | 4 | 0 |
| 1991 | 6 | 0 |
| 1992 | 2 | 0 |
| 1993 | 4 | 0 |
| 1994 | 7 | 0 |
| 1995 | 1 | 0 |
| 1996 | 11 | 0 |
| 1997 | 6 | 0 |
| 1998 | 9 | 0 |
| 1999 | 10 | 0 |
| 2000 | 9 | 0 |
| 2001 | 10 | 4 |
| 2002 | 18 | 37 |
| 2003 | 43 | 35 |
| 2004 | 38 | 53 |
| 2005 | 41 | 62 |
| 2006 | 59 | 98 |
| 2007 | 64 | 58 |
| 2008 | 65 | 83 |
| 2009 | 54 | 48 |
| 2010 | 43 | 35 |
| 2011 | 43 | 47 |
| 2012 | 42 | 45 |
| 2013 | 51 | 48 |
| 2014 | 58 | 86 |
| 2015 | 56 | 65 |
| 2016 | 59 | 41 |
| 2017 | 61 | 71 |
| 2018 | 62 | 67 |
| 2019 | 64 | 87 |
| 2020 | 84 | 117 |
| 2021 | 87 | 123 |
| 2022 | 98 | 129 |
| 2023 | 87 | 141 |
| 2024 | 94 | 134 |
| 2025 | 92 | 113 |
| 2026 | 73 | 79 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Overlay target measurement and shift compensation in charged particle systems and related methods6 Oct 2026US 12,754,150 B2Applied Materials Israel Ltd.
- Method for processing sampled proppant during hydraulic fracturing22 Sep 2026US 12,742,385 B2Gti Energy
- Inspection system15 Sep 2026US 12,736,487 B2Hitachi High-Tech Corporation
- Wafer measurement apparatus and operating method thereof15 Sep 2026US 12,736,488 B2Samsung Electronics Co., Ltd.
- Charged particle beam device and specimen observation method15 Sep 2026US 12,738,442 B2Hitachi High-Tech Corporation
- Sample preparation system for electron microscopy8 Oct 2026US 2026/0309653 A1The Regents of the University of California
- Method for measuring defects in two-component compound wafer and apparatus thereof8 Oct 2026US 2026/0309655 A1SK Siltron Co., Ltd.
- Extended range active illumination imager24 Sep 2026US 2026/0287528 A1NexGen Semi Holding, Inc.
- Adaptive fudicials for mult-modal radiotherapy17 Sep 2026US 2026/0272604 A2IZI Medical Products
- Method and apparatus for dictionary learning and for reconstructing images using a dictionary17 Sep 2026US 2026/0276569 A1The University of Liverpool
Most cited
By later US patents
- Device and method for analyzing an organic sample265US 8,263,933 B2Carl Zeiss NTS GmbH · 2012
- Apparatus and methods for inspecting wafers and masks using multiple charged-particle beams156US 5,892,224 ANikon Corporation · 1999
- Wafer pattern defect detection method and apparatus therefor138US 5,576,833 AKabushiki Kaisha Toshiba · 1996
- Method for inspecting substrate, substrate inspecting system and electron beam apparatus113US 7,109,483 B2Ebara Corporation · 2006
- Object inspection and/or modification system and method89US 6,337,479 B12002