Method for measuring defects in two-component compound wafer and apparatus thereof
AssigneeSK Siltron Co., Ltd.
InventorsWon Jun LEE, Seob SHIM, Woo Sung LEE
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AssigneeSK Siltron Co., Ltd.
InventorsWon Jun LEE, Seob SHIM, Woo Sung LEE
Estimating the term…
The present embodiment relates to a method for measuring defects in two-component compound wafer capable of detecting P-Count ScN defects in a two-component compound wafer using a highly accurate quantitative measurement method, and an apparatus thereof. According to one aspect of the embodiment, a method for measuring defects in a two-component compound wafer is provided, and the method includes a first step of measuring content of matrix A elements and matrix B elements in a wafer composed of the matrix A elements and the matrix B elements; and a second step of calculating a ratio of the matrix A elements and the matrix B elements measured in the first step to determine a P-Count ScN defect level.
A method for measuring defects in a two-component compound wafer, comprising:
An apparatus for measuring defects in a two-component compound wafer, comprising:
Dependencies are inferred from the claim text.