Hybrid x-ray and optical metrology and navigation
AssigneeTokyo Electron Limited
InventorsFrancisco Machuca, Vi Vuong, Andrej Mitrovic, Xinkang Tian, Holger Tuitje
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AssigneeTokyo Electron Limited
InventorsFrancisco Machuca, Vi Vuong, Andrej Mitrovic, Xinkang Tian, Holger Tuitje
Estimating the term…
A method of characterizing a substrate includes illuminating a region of the substrate with a broadband optical beam within an optical field of view (FOV) at the region, illuminating a portion of the region with an X-ray beam within an X-ray FOV at the portion of the region, and concurrently acquiring an X-ray image of the X-ray FOV and an optical image of the optical FOV. The X-ray FOV is smaller than or equal to the optical FOV and also overlaps the X-ray FOV. The method may include switching between a higher magnification and a lower magnification by switching between the X-ray FOV and the optical FOV. The method may include comparing equivalent areas across different portions of the substrate using spectral matching and pixel binning to increase signal-to-noise ratio. A system including a broadband optical source and an X-ray source may be configured to perform the method.
A method of characterizing a substrate, the method comprising:
A system for characterizing a substrate comprising:
A method of characterizing a substrate, the method comprising:
Dependencies are inferred from the claim text.