C23F 1/12
Gaseous compositions
C23F1/12 (Gaseous compositions) appears on 220 US grants and 232 published applications in this corpus.
Search patents in C23F- Granted patents
- 220
- Published applications
- 232
- Assignees
- 112
- Inventors
- 515
- Latest grant
- 16 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 2 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 3 | 0 |
| 1985 | 2 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 3 | 0 |
| 1992 | 2 | 0 |
| 1993 | 3 | 0 |
| 1994 | 2 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 1 | 0 |
| 1999 | 2 | 0 |
| 2000 | 5 | 0 |
| 2001 | 5 | 2 |
| 2002 | 2 | 2 |
| 2003 | 5 | 2 |
| 2004 | 1 | 4 |
| 2005 | 1 | 4 |
| 2006 | 4 | 6 |
| 2007 | 2 | 3 |
| 2008 | 2 | 4 |
| 2009 | 1 | 0 |
| 2010 | 3 | 1 |
| 2011 | 0 | 0 |
| 2012 | 1 | 6 |
| 2013 | 4 | 4 |
| 2014 | 3 | 16 |
| 2015 | 13 | 24 |
| 2016 | 21 | 18 |
| 2017 | 13 | 9 |
| 2018 | 8 | 18 |
| 2019 | 18 | 20 |
| 2020 | 16 | 12 |
| 2021 | 6 | 13 |
| 2022 | 12 | 21 |
| 2023 | 15 | 13 |
| 2024 | 10 | 11 |
| 2025 | 15 | 12 |
| 2026 | 7 | 7 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Organometallic compounds for the deposition of high purity tin oxide and dry etching of the tin oxide films and deposition reactors16 Jun 2026US 12,655,164 B2Seastar Chemicals Ulc
- Metal etch2 Jun 2026US 12,648,381 B2Lam Research Corporation
- Selective thermal atomic layer etching31 Mar 2026US 12,590,374 B2Versum Materials US, LLC
- Process for removing tin oxide deposits17 Feb 2026US 12,552,819 B2Seastar Chemicals Ulc
- Atomic layer roughness reducing methods and devices10 Feb 2026US 12,546,013 B2Nanoclear Technologies Inc.
- Vapor-phase etch of metal-containing materials8 Oct 2026US 2026/0308770 A1Versum Materials US, LLC
- Atomic layer etching method for metal oxide film24 Sep 2026US 2026/0286531 A1SK Specialty Co., Ltd
- Metal etch17 Sep 2026US 2026/0282783 A1Lam Research Corporation
- Mask manufacturing method and mask23 Jul 2026US 2026/0209926 A1Dai Nippon Printing Co.Ltd.
- Mask and method of manufacturing mask16 Jul 2026US 2026/0201534 A1Dai Nippon Printing Co.Ltd.
Most cited
By later US patents
- Oxide and metal removal562US 9,309,598 B2APPLIED Materials.Inc. · 2016
- Selectively etching metals and metal nitrides conformally372US 9,449,843 B1APPLIED Materials.Inc. · 2016
- Etching method and etching apparatus343US 9,991,138 B2Tokyo Electron Limited · 2018
- Cleaning gas and method for cleaning vacuum treatment apparatus by flowing the cleaning gas301US 6,659,111 B1Central Glass Company, Limited · 2003
- Etching techniques166US 4,498,953 AAT&T Bell Laboratories · 1985