Mask manufacturing method and mask
AssigneeDai Nippon Printing Co., Ltd.
InventorKatsumi HASHIMOTO
Life of this patent
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AssigneeDai Nippon Printing Co., Ltd.
InventorKatsumi HASHIMOTO
Estimating the term…
A mask manufacturing method may include: a step for preparing a substrate including a first substrate surface and a second substrate surface located opposite the first substrate surface; a step for forming a first insulation layer including a first insulation surface facing the second substrate surface, a second insulation surface located opposite the first insulation surface, and an insulation opening extending through from the first insulation surface to the second insulation surface; a step for forming a first metallic layer in the insulation opening, the first metallic layer including a first metallic surface facing the second substrate surface and a second metallic surface located opposite the first metallic surface; a step for removing the first insulation layer surrounded by the first metallic layer in plan view; and a step for forming a first opening in the substrate, the first opening overlapping the first metallic layer in plan view.
A mask manufacturing method comprising:
A mask comprising:
Dependencies are inferred from the claim text.