C23C 16/463
Cooling of the substrate
Official title: {Cooling of the substrate}
C23C16/463 (Cooling of the substrate) appears on 423 US grants and 532 published applications in this corpus.
Search patents in C23C- Granted patents
- 423
- Published applications
- 532
- Assignees
- 215
- Inventors
- 1,309
- Latest grant
- 8 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 3 | 0 |
| 1992 | 1 | 0 |
| 1993 | 7 | 0 |
| 1994 | 7 | 0 |
| 1995 | 3 | 0 |
| 1996 | 19 | 0 |
| 1997 | 10 | 0 |
| 1998 | 11 | 0 |
| 1999 | 12 | 0 |
| 2000 | 11 | 0 |
| 2001 | 9 | 5 |
| 2002 | 16 | 18 |
| 2003 | 7 | 10 |
| 2004 | 12 | 9 |
| 2005 | 9 | 9 |
| 2006 | 4 | 5 |
| 2007 | 2 | 10 |
| 2008 | 1 | 10 |
| 2009 | 1 | 15 |
| 2010 | 5 | 12 |
| 2011 | 7 | 16 |
| 2012 | 7 | 22 |
| 2013 | 2 | 17 |
| 2014 | 19 | 14 |
| 2015 | 13 | 32 |
| 2016 | 15 | 18 |
| 2017 | 18 | 21 |
| 2018 | 12 | 27 |
| 2019 | 18 | 35 |
| 2020 | 18 | 34 |
| 2021 | 18 | 26 |
| 2022 | 22 | 45 |
| 2023 | 25 | 41 |
| 2024 | 28 | 42 |
| 2025 | 29 | 22 |
| 2026 | 20 | 17 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Film forming method and film forming apparatus8 Sep 2026US 12,733,415 B2Tokyo Electron Limited
- Methods and systems for improved deposition products28 Jul 2026US 12,692,598 B2Lotus Applied Technology, LLC
- Cooling device, semiconductor manufacturing apparatus, and semiconductor manufacturing method14 Jul 2026US 12,680,156 B2Canon Kabushiki Kaisha
- Stage for heating and cooling object14 Jul 2026US 12,680,167 B2Advantec Co., Ltd.
- Apparatus and methods for controlling substrate temperature during processing14 Jul 2026US 12,683,131 B2APPLIED Materials.Inc.
- Deposition system with integrated carrier cleaning modules17 Sep 2026US 2026/0275502 A1Veeco Instruments Inc.
- A thin-film deposition apparatus cluster17 Sep 2026US 2026/0275520 A1Picosun Oy
- Deposition system with integrated carrier cleaning modules10 Sep 2026US 2026/0265903 A1Veeco Instruments Inc.
- Pedestals and showerheads including channels with decreasing flow velocities20 Aug 2026US 2026/0242950 A1Lam Research Corporation
- Substrate processing apparatus, substrate processing method, method of manufacturing semiconductor device, and recording medium20 Aug 2026US 2026/0242953 A1Kokusai Electric Corporation
Most cited
By later US patents
- CVD Processing chamber1,003US 5,558,717 AAPPLIED Materials.Inc. · 1996
- Stage having electrostatic chuck and plasma processing apparatus using same921US 5,382,311 ATokyo Electron Limited · 1995
- Sequencing of the recipe steps for the optimal low-k HDP-CVD processing882US 5,937,323 AAPPLIED Materials.Inc. · 1999
- High temperature multi-layered alloy heater assembly and related methods858US 6,035,101 AAPPLIED Materials.Inc. · 2000
- Sequencing of the recipe steps for the optimal low-dielectric constant HDP-CVD Processing817US 6,217,658 B1APPLIED Materials.Inc. · 2001