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US 12,692,598 B2Granted
Methods and systems for improved deposition products
AssigneeLotus Applied Technology, LLC
InventorEric Dickey
Life of this patent
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Abstract
This disclosure relates to methods and systems for selective atomic layer deposition. Cycle-by-cycle post-processing of the thin film occurs during growth of the thin film, instead of conducting post-processing after completion of the thin film. Thin films with improved properties result.
Claims20
A method of forming a thin patterned material, the method comprising:
- providing a substrate to be coated;
- and
- repeatedly performing a cycle comprising:
- exposing the substrate to a first precursor, resulting in some of the first precursor adsorbing on the substrate as an adsorbed first precursor;
- exposing the substrate to a second precursor, resulting in some of the second precursor reacting with the adsorbed first precursor to form an intermediate product on the surface;
- and
- scanning the substrate with a localized energy that is applied to the intermediate product in a specific pattern to convert a patterned portion of the intermediate product to a final product in the specific pattern, resulting in the patterned portion of the intermediate product converting to the final product with a growth-rate less than or equal to about one molecular layer of the final product per cycle,
- whereby after multiple cycles a thin pattern of the final product is formed on the substrate in the specific pattern.
5 more elements
Dependencies are inferred from the claim text.