A thin-film deposition apparatus cluster

Abstract

A substrate processing system (1900) comprising, a reception module (1910) configured to load and unload substrates (130) to and from the substrate processing system (1900), and a heating module (1930) configured to heat substrates (130), and at least one processing module (1950) configured to process the substrates (130) with sequential self-limiting surface reactions, the at least one processing module (1910) comprising a laminar flow reaction chamber (120) and a substrate lifting system (500) configured to transfer substrates (130), in a direction perpendicular to surfaces thereof, between a loading position and a processing position, and a transfer unit (1910) comprising a robotic system configured to transfer the substrates (130) between said reception module, said heating module, and said at least one processing module.

Dependencies are inferred from the claim text.