C23C 16/4588
The substrate being rotated
Official title: {the substrate being rotated}
C23C16/4588 (The substrate being rotated) appears on 93 US grants and 97 published applications in this corpus.
Search patents in C23C- Granted patents
- 93
- Published applications
- 97
- Assignees
- 78
- Inventors
- 304
- Latest grant
- 28 Apr 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 2 | 0 |
| 1987 | 3 | 0 |
| 1988 | 2 | 0 |
| 1989 | 1 | 0 |
| 1990 | 3 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 2 | 0 |
| 1997 | 3 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 5 | 0 |
| 2001 | 2 | 0 |
| 2002 | 2 | 0 |
| 2003 | 1 | 0 |
| 2004 | 0 | 0 |
| 2005 | 1 | 4 |
| 2006 | 1 | 1 |
| 2007 | 1 | 1 |
| 2008 | 2 | 3 |
| 2009 | 0 | 3 |
| 2010 | 0 | 1 |
| 2011 | 0 | 8 |
| 2012 | 0 | 3 |
| 2013 | 5 | 2 |
| 2014 | 0 | 5 |
| 2015 | 5 | 6 |
| 2016 | 0 | 1 |
| 2017 | 4 | 4 |
| 2018 | 3 | 4 |
| 2019 | 3 | 5 |
| 2020 | 5 | 9 |
| 2021 | 1 | 9 |
| 2022 | 6 | 8 |
| 2023 | 6 | 8 |
| 2024 | 9 | 5 |
| 2025 | 6 | 4 |
| 2026 | 2 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Semiconductor substrate processing tool with hot plate chamber28 Apr 2026US 12,615,963 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium6 Jan 2026US 12,518,981 B2Kokusai Electric Corporation
- Methods for manufacturing a semiconductor wafer using a preheat ring in a wafer reactor23 Dec 2025US 12,503,792 B2GlobalWafers Co., Ltd.
- Layer with discrete islands formed on a substrate support16 Dec 2025US 12,497,697 B2APPLIED Materials.Inc.
- Methods for forming films on substrates18 Nov 2025US 12,473,639 B2APPLIED Materials.Inc.
- Integrated substrate processing apparatus and method20 Aug 2026US 2026/0242952 A1Picosun Oy
- Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium23 Apr 2026US 2026/0114209 A1Kokusai Electric Corporation
- Methods Of Operating A Spatial Deposition Tool12 Feb 2026US 2026/0047394 A1APPLIED Materials.Inc.
- Methods of operating a spatial deposition tool24 Jul 2025US 2025/0239479 A1APPLIED Materials.Inc.
- Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium3 Jul 2025US 2025/0215563 A1Kokusai Electric Corporation
Most cited
By later US patents
- Susceptor and baffle therefor558US 5,518,549 AMEMC Electronic Materials, Inc. · 1996
- Induction heated reactor system for chemical vapor deposition519US 4,579,080 AAPPLIED Materials.Inc. · 1986
- Variable gap hard stop design472US 10,087,525 B2ASM IP Holding B. V. · 2018
- Heating element for use in a hot filament chemical vapor deposition chamber355US 6,432,206 B1SI Diamond Technology, Inc. · 2002
- Susceptor assembly352US 4,496,828 AUltra Carbon Corporation · 1985