C23C 16/4587
The substrate being supported substantially vertically
Official title: {the substrate being supported substantially vertically}
C23C16/4587 (The substrate being supported substantially vertically) appears on 217 US grants and 265 published applications in this corpus.
Search patents in C23C- Granted patents
- 217
- Published applications
- 265
- Assignees
- 152
- Inventors
- 704
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 2 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 2 | 0 |
| 1986 | 2 | 0 |
| 1987 | 3 | 0 |
| 1988 | 2 | 0 |
| 1989 | 3 | 0 |
| 1990 | 4 | 0 |
| 1991 | 4 | 0 |
| 1992 | 4 | 0 |
| 1993 | 0 | 0 |
| 1994 | 3 | 0 |
| 1995 | 1 | 0 |
| 1996 | 2 | 0 |
| 1997 | 3 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 7 | 0 |
| 2001 | 2 | 1 |
| 2002 | 2 | 1 |
| 2003 | 3 | 3 |
| 2004 | 2 | 1 |
| 2005 | 3 | 7 |
| 2006 | 1 | 2 |
| 2007 | 1 | 1 |
| 2008 | 2 | 6 |
| 2009 | 0 | 10 |
| 2010 | 3 | 6 |
| 2011 | 1 | 23 |
| 2012 | 3 | 10 |
| 2013 | 10 | 11 |
| 2014 | 7 | 13 |
| 2015 | 12 | 11 |
| 2016 | 4 | 9 |
| 2017 | 6 | 14 |
| 2018 | 8 | 16 |
| 2019 | 9 | 12 |
| 2020 | 9 | 19 |
| 2021 | 12 | 23 |
| 2022 | 19 | 17 |
| 2023 | 10 | 18 |
| 2024 | 19 | 18 |
| 2025 | 11 | 6 |
| 2026 | 10 | 7 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Film forming apparatus6 Oct 2026US 12,753,504 B2Tokyo Electron Limited
- Acoustic wave assisted chemical vapor iinfiltration1 Sep 2026US 12,723,306 B2Rtx Corporation
- Apparatus comprising a removable tool for infiltration in the gas phase9 Jun 2026US 12,652,990 B2Safran Ceramics
- Plasma-enhanced chemical vapor deposition reactors and associated methods2 Jun 2026US 12,646,678 B2Kayaku Advanced Materials, Inc.
- Semiconductor substrate processing tool with hot plate chamber28 Apr 2026US 12,615,963 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Wafer boat assembly and semiconductor process equipment17 Sep 2026US 2026/0282816 A1Beijing Naura Microelectronics Equipment Co., Ltd.
- Method and Device for Producing a SiC Solid Material10 Sep 2026US 2026/0265951 A1
- Boat apparatus3 Sep 2026US 2026/0258555 A1Hanwha Solutions Corporation
- Integrated substrate processing apparatus and method20 Aug 2026US 2026/0242952 A1Picosun Oy
- Wafer boat device and plasma dissociation furnace tube system7 May 2026US 2026/0130168 A1Metal Industries Research & Development Centre
Most cited
By later US patents
- Susceptor and baffle therefor558US 5,518,549 AMEMC Electronic Materials, Inc. · 1996
- Induction heated reactor system for chemical vapor deposition519US 4,579,080 AAPPLIED Materials.Inc. · 1986
- Variable gap hard stop design472US 10,087,525 B2ASM IP Holding B. V. · 2018
- Heating element for use in a hot filament chemical vapor deposition chamber355US 6,432,206 B1SI Diamond Technology, Inc. · 2002
- Susceptor assembly352US 4,496,828 AUltra Carbon Corporation · 1985