Susceptor and baffle therefor
AssigneeMEMC Electronic Materials, Inc.
InventorLance G. Hellwig
Life of this patent
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Abstract
A susceptor for holding semiconductor wafers in a barrel reactor for chemical vapor deposition of material on the wafers having a baffle for reducing the amount of material deposited at the bottom of the lowest wafers held in the susceptor. The baffle includes a plate mounted on the bottom of the susceptor and a deflector for each wall of the susceptor. The deflectors each have the shape of a chordal section of a cylinder and are mounted on the plate against a respective wall of the susceptor below the lowest wafer-holding recess on that wall of the susceptor.
Claims22
A susceptor for supporting semiconductor wafers in a barrel reactor for chemical vapor deposition of material on the wafers, the susceptor comprising walls arranged in a generally polygonal formation, a lower recess in each wall located generally adjacent to the bottom of the wall, baffle means located below the lower recess of each wall for diverting some of the vapor flowing in the barrel reactor away from a bottom region of the lower recess and a bottom portion of the semiconductor wafer disposed in the lower recess thereby to retard deposition of material near the bottom of the semiconductor wafer.
A baffle for use on a susceptor constructed for holding semiconductor wafers in a barrel reactor for chemical vapor deposition of material on the wafers, the baffle comprising deflectors and means for mounting the deflectors on the susceptor, the deflectors being shaped for deflecting at least some of the flow of vapor in the barrel reactor away from a bottom region of a wafer to limit deposition of material on the bottom region of the wafer.
Dependencies are inferred from the claim text.