Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium

A substrate processing apparatus, comprising:

• a processing module including a process container in which at least one substrate is processed and a first gate valve installed at a front side of the processing module;
• a utility system including a supply system configured to supply a processing gas into the process container, a surface of the utility system is connected or arranged close to a rear surface of the processing module;
• a vacuum-exhauster arranged behind the processing module and configured to exhaust an inside of the process container;
• an exhaust pipe configured to bring the process container into fluid communication with the vacuum-exhauster;
• a pipe housing configured to support the exhaust pipe;
• and
• a first vibration-damping fastener connecting the vacuum-exhauster and the pipe housing,
• wherein the exhaust pipe includes a first flexible portion configured to allow displacement of an end of the exhaust pipe and installed outside the vacuum-exhauster, and
• wherein the vacuum-exhauster and the pipe housing are installed at a floor.