C23C 16/4581
Characterised by material of construction or surface finish of the means for
Official title: {characterised by material of construction or surface finish of the means for supporting the substrate}
C23C16/4581 (Characterised by material of construction or surface finish of the means for) appears on 419 US grants and 644 published applications in this corpus.
Search patents in C23C- Granted patents
- 419
- Published applications
- 644
- Assignees
- 228
- Inventors
- 1,553
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 2 | 0 |
| 1995 | 8 | 0 |
| 1996 | 6 | 0 |
| 1997 | 3 | 0 |
| 1998 | 7 | 0 |
| 1999 | 4 | 0 |
| 2000 | 13 | 0 |
| 2001 | 8 | 8 |
| 2002 | 20 | 28 |
| 2003 | 14 | 24 |
| 2004 | 12 | 31 |
| 2005 | 13 | 33 |
| 2006 | 9 | 20 |
| 2007 | 8 | 21 |
| 2008 | 10 | 17 |
| 2009 | 8 | 23 |
| 2010 | 14 | 11 |
| 2011 | 7 | 13 |
| 2012 | 10 | 10 |
| 2013 | 10 | 11 |
| 2014 | 9 | 10 |
| 2015 | 6 | 25 |
| 2016 | 6 | 26 |
| 2017 | 15 | 22 |
| 2018 | 15 | 25 |
| 2019 | 18 | 31 |
| 2020 | 27 | 41 |
| 2021 | 19 | 29 |
| 2022 | 24 | 47 |
| 2023 | 26 | 51 |
| 2024 | 25 | 41 |
| 2025 | 22 | 32 |
| 2026 | 15 | 14 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Substrate support unit, and apparatus and method for depositing a layer using the same15 Sep 2026US 12,740,377 B2Evatec AG
- Substrate processing apparatus1 Sep 2026US 12,727,439 B2Tokyo Electron Limited
- Substrate holding unit and substrate processing apparatus11 Aug 2026US 12,703,917 B2Samsung Electronics Co., Ltd.
- Wafer susceptor16 Jun 2026US 12,655,518 B2Enkris Semiconductor, Inc.
- Ceramic susceptor16 Jun 2026US 12,660,569 B2NGK Insulators, Ltd.
- Electrostatic chuck, substrate processing apparatus, and substrate processing method3 Sep 2026US 2026/0262472 A1Tokyo Electron Limited
- Semiconductor processing chamber component with a metal body and laser glazed ceramic coating6 Aug 2026US 2026/0231729 A1Lam Research Corporation
- High heat loss heater and electrostatic chuck for semiconductor processing23 Jul 2026US 2026/0209943 A1APPLIED Materials.Inc.
- Substrate retainer16 Jul 2026US 2026/0201560 A1Black Semiconductor Netherlands B.V.
- Semiconductor heat treatment member2 Jul 2026US 2026/0185233 A1Coorstek Gk
Most cited
By later US patents
- Wafer holding fixture for chemical reaction processes in rapid thermal processing equipment and method for making same643US 4,978,567 AMaterials Technology Corporation, subsidiary of the Carbon/Graphite Group, Inc. · 1990
- Rapid thermal processing apparatus for processing semiconductor wafers624US 5,444,217 AMoore Epitaxial, Inc. · 1995
- Susceptor for radiant absorption heater system567US 4,499,354 AGeneral Instrument Corporation · 1985
- Susceptor of apparatus for manufacturing semiconductor device549US 6,884,319 B2Jusung Engineering Co., Ltd. · 2005
- Susceptor546US 7,393,418 B2Covalent Materials Corporation · 2008